⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28158179 | 0.77 | GSK3A (0.30) | — | |
| SCHEMBL331188 | 0.75 | — | — | |
| SCHEMBL548121 | 0.74 | STAT3 (0.35) | — | |
| SCHEMBL10428620 | 0.73 | STAT3 (0.39) | — | |
| SCHEMBL549066 | 0.73 | STAT3 (0.39) | — | |
| SCHEMBL586641 | 0.73 | STAT3 (0.39) | — | |
| SCHEMBL31374859 | 0.71 | — | — | |
| SCHEMBL29396129 | 0.71 | — | — | |
| SCHEMBL31374860 | 0.71 | — | — | |
| SCHEMBL3162544 | 0.71 | KEAP1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105765075-A | Method for detecting fluorescence or absorbance, method for suppressing background, method for measuring ADP, method for measuring activity of ADP-synthesizing enzyme, and method for measuring activity of glucosyltransferase | 国立大学法人东京大学 | 2016-07-13 | — | — | CN | claimed |
| US-20250183044-A1 | SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT | FUJIMI INCORPORATED (JP) | 2025-06-05 | — | — | US | disclosed |
| US-12249513-B2 | Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment | FUJIMI INCORPORATED (JP) | 2025-03-11 | — | — | US | disclosed |
| US-20240141161-A1 | BIODEGRADABLE RESIN AQUEOUS DISPERSION, FILM FORMING AGENT USING SAME, AND METHOD FOR FORMING FILM | MIYOSHI OIL & FAT CO.,LTD. (JP) | 2024-05-02 | — | — | US | disclosed |
| CN-111885997-B | Water-absorbing abrasive, method for producing same, and cosmetic | 住友精化株式会社 | 2023-05-09 | — | — | CN | disclosed |
| CN-115703207-A | Surface treatment method, method for manufacturing semiconductor substrate, surface treatment composition, and system for manufacturing semiconductor substrate | 福吉米株式会社 | 2023-02-17 | — | — | CN | disclosed |
| US-20230053210-A1 | SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT | FUJIMI INCORPORATED (JP) | 2023-02-16 | — | — | US | disclosed |
| CN-111902581-B | Sandbag and manufacturing method thereof | 住友精化株式会社 | 2023-02-03 | — | — | CN | disclosed |
| US-20210138434-A1 | SANDBAG AND METHOD FOR PRODUCING SAME | SUMITOMO SEIKO CHEMICALS CO., LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| US-10987299-B2 | Polylactic acid-containing aqueous dispersion | TOYOBO CO., LTD. (JP) | 2021-04-27 | — | — | US | disclosed |
| EP-0396303-B1 | Process for producing and use of maleic acid (co-) polymer salt improved in biodegradability | NIPPON CATALYTIC CHEM IND (JP) | 1994-12-28 | — | — | EP | disclosed |
| EP-0368563-B1 | Drilling fluid additives | NIPPON CATALYTIC CHEM IND (JP) | 1994-02-16 | — | — | EP | disclosed |
| EP-0337694-B1 | Process for producing acid-type maleic acid polymer and water-treating agent and detergent additive containing said polymer | NIPPON CATALYTIC CHEM IND (JP) | 1993-12-29 | — | — | EP | disclosed |
| US-5135677-A | Process for producing acid-type maleic acid polymer and water-treating agent and detergent additive containing said polymer | NIPPON SHOKUBAI CO., LTD. (JP) | 1992-08-04 | — | — | US | disclosed |
| US-5064563-A | Hydrogen peroxide polymerization catalyst copper or iron ions and alkali to neutralize acid; detergent builder | NIPPON SHOKUBAI CO., LTD. (JP) | 1991-11-12 | — | — | US | disclosed |
| EP-0396303-A2 | Process for producing and use of maleic acid (co-) polymer salt improved in biodegradability | NIPPON SHOKUBAI CO., LTD. (JP) | 1990-11-07 | — | — | EP | disclosed |
| EP-0368563-A2 | Drilling fluid additives | NIPPON SHOKUBAI CO., LTD. (JP) | 1990-05-16 | — | — | EP | disclosed |
| US-4892902-A | WATER SOLUBLE CONDENSED PHOSPHATE AND WATER SOLUBLE ANIONIC MODIFIED POLYVINYL ALCOHOL AS DISPERSANT | NIPPON SHOKUBAI KAGAKU, CO., LTD. (JP) | 1990-01-09 | — | — | US | disclosed |
| EP-0337694-A2 | Process for producing acid-type maleic acid polymer and water-treating agent and detergent additive containing said polymer | NIPPON SHOKUBAI CO., LTD. (JP) | 1989-10-18 | — | — | EP | disclosed |
| US-4818783-A | USING AS DISPERSANT WATE SOLUBLE CARBOXYL-CONTAINING POLYMER AND ANIONIC MODIFIED POLYVINYL ALCOHOL | NIPPON SHOKUBAI KAGAKU KOGYO CO., LTD. (JP) | 1989-04-04 | — | — | US | disclosed |