Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL717359

C=C(C)C(=O)OC(C)C(C)(C)Cl.N

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
ALDH1A1 P00352 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1815348 0.81 TSHR (0.43) TSHRALDH1A1
SCHEMBL3081441 0.81 TSHR (0.43) TSHRALDH1A1
Hydrochloric Acid SCHEMBL6473489 0.80 TSHR (0.39) TSHRALDH1A1
Ammonia Solution, Strong SCHEMBL986818 0.80 TSHR (0.39) TSHRALDH1A1
SCHEMBL7737945 0.79 TSHR (0.40) TSHRALDH1A1
SCHEMBL28469028 0.79 TSHR (0.42) TSHRALDH1A1
Ammonia Solution, Strong SCHEMBL19133679 0.78 TSHR (0.38) TSHRALDH1A1
SCHEMBL23494394 0.78 TSHR (0.41) TSHRALDH1A1
SCHEMBL12856975 0.78 TSHR (0.41) TSHRALDH1A1
SCHEMBL4952889 0.78 TSHR (0.41) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114673025-B High-efficiency strength scheme for papermaking in high-charge-demand systems 艺康美国股份有限公司 2023-12-05 CN claimed
US-11814548-B2 Polishing liquid, polishing liquid set, and polishing method RESONAC CORPORATION (JP) 2023-11-14 US claimed
CN-117005235-A Compositions and methods for improving papermaking processes 埃科莱布美国股份有限公司 2023-11-07 CN claimed
US-11773291-B2 Polishing liquid, polishing liquid set, and polishing method RESONAC CORPORATION (JP) 2023-10-03 US claimed
CN-110462796-B Polishing liquid, polishing liquid set, and polishing method 株式会社力森诺科 2023-10-03 CN claimed
CN-114673025-A High efficiency strength scheme for papermaking in high charge demand systems 艺康美国股份有限公司 2022-06-28 CN claimed
CN-107447582-B Efficient strength scheme for papermaking in high charge demand systems 艺康美国股份有限公司 2022-04-12 CN claimed
US-20220017783-A1 POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD RESONAC CORPORATION (JP) 2022-01-20 US claimed
US-11198796-B2 2021-12-14 US claimed
US-10704201-B2 Dry strength agent composition and method for enhancing the dry strength of paper ECOLAB USA INC. (US) 2020-07-07 US claimed
CN-106930142-B Dry strength agent composition and method for improving dry strength of paper 艺康美国股份有限公司 2020-03-24 CN claimed
US-20200032106-A1 POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD RESONAC CORPORATION (JP) 2020-01-30 US claimed
US-20180320316-A1 DRY STRENGTH AGENT COMPOSITION AND METHOD FOR ENHANCING THE DRY STRENGTH OF PAPER ECOLAB USA INC. (US) 2018-11-08 US claimed
EP-3397811-A1 DRY STRENGTH AGENT COMPOSITION AND METHOD FOR ENHANCING THE DRY STRENGTH OF PAPER Ecolab USA, Inc. (US) 2018-11-07 EP claimed
US-12584244-B2 Manufacturing method for colored nonwoven fabric KAO CORPORATION (JP) 2026-03-24 US disclosed
US-12577712-B2 Colored non-woven fabric KAO CORPORATION (JP) 2026-03-17 US disclosed
US-12565599-B2 Slurry, polishing method, and method for manufacturing semiconductor component RESONAC CORPORATION (JP) 2026-03-03 US disclosed
EP-1422071-A1 Ink jet recording sheet Fuji Photo Film Co., Ltd. (JP) 2004-05-26 EP disclosed
US-20030198885-A1 Recording material support, process for manufacturing the same, recording material and process for image formation FUJI PHOTO FILM CO., LTD. 2003-10-23 US disclosed
EP-1325815-A2 Ink-jet recording sheet FUJI PHOTO FILM CO., LTD. (JP) 2003-07-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12565599-B2 Slurry, polishing method, and method for manufacturing semiconductor component STIP1, SGK1, SGK3 TSHR 1506/4885ALDH1A1 4664/4885
US-12577712-B2 Colored non-woven fabric CUTA, LCP1, CRY2 TSHR 1249/4885ALDH1A1 3320/4885
US-12584244-B2 Manufacturing method for colored nonwoven fabric CUTA, TMPO, TEX10 TSHR 2303/4885ALDH1A1 2712/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.