Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.38 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.37 |
| ▸ | TUBB | P07437 | 1/20 | 0.37 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.37 |
| ▸ | STAT3 | P40763 | 1/20 | 0.37 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.37 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.37 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.37 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.37 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.37 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.37 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.37 |
| ▸ | TUBA1A | Q71U36 | 1/20 | 0.37 |
| ▸ | TUBA1C | Q9BQE3 | 1/20 | 0.37 |
| ▸ | TUBB6 | Q9BUF5 | 1/20 | 0.37 |
| ▸ | TUBB2B | Q9BVA1 | 1/20 | 0.37 |
| ▸ | TUBB1 | Q9H4B7 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5855658 | 0.84 | CA1 (0.35) | KDM4ESIGMAR1TUBB4ATUBBTUBA3C | |
| SCHEMBL1056365 | 0.75 | ALDH1A1 (0.46) | KDM4ECA1CA2CA9ALDH1A1 | |
| SCHEMBL29937164 | 0.75 | ALDH1A1 (0.46) | KDM4ECA1CA2CA9ALDH1A1 | |
| SCHEMBL13715191 | 0.74 | CA1 (0.37) | KDM4ESIGMAR1TUBB4ATUBBTUBA3C | |
| SCHEMBL10160679 | 0.74 | CA1 (0.37) | KDM4ESIGMAR1TUBB4ATUBBTUBA3C | |
| Hydrogen Sulfide SCHEMBL27507715 | 0.73 | ALDH1A1 (0.45) | KDM4ECA1CA2CA9ALDH1A1 | |
| SCHEMBL5857980 | 0.73 | ALDH1A1 (0.39) | CA1CA2CA9ALDH1A1MEN1 | |
| SCHEMBL30290794 | 0.72 | CA1 (0.46) | TUBB4ATUBBTUBA3CTUBA1BTUBA4A | |
| SCHEMBL6317091 | 0.72 | C5AR1 (0.49) | KDM4ESIGMAR1TUBB4ATUBBTUBA3C | |
| SCHEMBL11335093 | 0.70 | SIGMAR1 (0.40) | KDM4ESIGMAR1TUBB4ATUBBTUBA3C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 143 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7504195-B2 | Photosensitive polymer and photoresist composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-03-17 | — | — | US | claimed |
| US-7419761-B2 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-09-02 | — | — | US | claimed |
| US-7399570-B2 | Water-soluble negative photoresist polymer and composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-07-15 | — | — | US | claimed |
| US-7361447-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-04-22 | — | — | US | claimed |
| US-20080057436-A1 | PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-03-06 | — | — | US | claimed |
| US-7338742-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-03-04 | — | — | US | claimed |
| US-7282318-B2 | Photoresist composition for EUV and method for forming photoresist pattern using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-10-16 | — | — | US | claimed |
| US-7279256-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-10-09 | — | — | US | claimed |
| US-7270934-B2 | Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2007-09-18 | — | — | US | claimed |
| US-7235349-B2 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2007-06-26 | — | — | US | claimed |
| US-20030091927-A1 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion | HYNIX SEMICONDUCTOR INC. (KR) | 2003-05-15 | — | — | US | claimed |
| US-20030022101-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | INTELLECTUAL DISCOVERY CO. LTD. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030022100-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030003379-A1 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-02 | — | — | US | claimed |
| US-6455226-B1 | POLYMER FORMED BY POLYMERIZING MIXTURE OF NORBORNYLENE AND MALEIC ANHYDRIDE DERIVATIVE, REDUCING POLYMER WITH REDUCING AGENT, REACTING WITH HYDROXY PROTECTING GROUP PRECURSOR | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-09-24 | — | — | US | claimed |
| US-20020081504-A1 | Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2002-06-27 | — | — | US | claimed |
| US-20020061461-A1 | Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2002-05-23 | — | — | US | claimed |
| US-20020061466-A1 | Photoresist monomer, polymer thereof and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2002-05-23 | — | — | US | claimed |
| US-20020031721-A1 | Photoresist composition for top-surface imaging processes by silylation | HYNIX SEMICONDUCTOR INC. (KR) | 2002-03-14 | — | — | US | claimed |
| US-20020018960-A1 | Novel photoresist polymers, and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2002-02-14 | — | — | US | claimed |