SCHEMBL7182064

SCHEMBL7182064

O=C(OCCCCCO)C1CC2C=CC1C2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.43
KMT2A Q03164 3/20 0.43
RAB9A P51151 1/20 0.43
LMNA P02545 2/20 0.42
KDM4E B2RXH2 2/20 0.42
POLB P06746 3/20 0.42
HSD17B10 Q99714 2/20 0.42
APEX1 P27695 1/20 0.42
RECQL P46063 1/20 0.42
BLM P54132 1/20 0.42
ESR2 Q92731 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
HPGD P15428 1/20 0.42
EPHX2 P34913 1/20 0.36
MAPK1 P28482 2/20 0.36
MAPT P10636 1/20 0.35
MEN1 O00255 1/20 0.35
ALOX15 P16050 1/20 0.35
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7186926 1.00 ALDH1A1 (0.43) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL7179257 1.00 ALDH1A1 (0.43) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL7186934 1.00 ALDH1A1 (0.43) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL5184419 0.98 ALDH1A1 (0.44) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL5186060 0.94 ALDH1A1 (0.45) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL14449126 0.94 LMNA (0.47) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL4400473 0.94 LMNA (0.47) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL31366090 0.94 LMNA (0.47) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL3717301 0.94 LMNA (0.47) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL4403494 0.92 LMNA (0.49) ALDH1A1KMT2ARAB9ALMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20010053834-A1 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same JUNG MIN HO (KR) 2001-12-20 US claimed
US-6632903-B2 Chemical and etching resistance HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2003-10-14 US disclosed
US-20010053834-A1 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same JUNG MIN HO (KR) 2001-12-20 US disclosed
US-6312865-B1 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-11-06 US disclosed