SCHEMBL7183515

SCHEMBL7183515

CCCCCCCCCCC(O)C(O)OC(C)=O.[NaH]

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 7/20 0.46
SPHK1 Q9NYA1 2/20 0.46
FFAR1 O14842 2/20 0.46
ABCB1 P08183 1/20 0.45
CYP2D6 P10635 2/20 0.43
GMNN O75496 1/20 0.43
LMNA P02545 1/20 0.43
POLB P06746 1/20 0.43
THPO P40225 1/20 0.43
MTOR P42345 1/20 0.43
BLM P54132 1/20 0.43
KDM4E B2RXH2 1/20 0.43
TP53 P04637 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
MAPT P10636 1/20 0.43
CETP P11597 1/20 0.43
HTT P42858 1/20 0.43
UBE2N P61088 1/20 0.43
FAAH O00519 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23898367 0.79 SPHK1 (0.47) GPR84SPHK1FFAR1ABCB1CYP2D6
SCHEMBL12611049 0.79 PTPN1 (0.49) GPR84SPHK1FFAR1ABCB1CYP2D6
SCHEMBL14715568 0.79 GPR84 (0.52) GPR84SPHK1FFAR1ABCB1MAPT
SCHEMBL10698423 0.79 PTPN1 (0.49) GPR84SPHK1FFAR1ABCB1CYP2D6
SCHEMBL11782957 0.79 GPR84 (0.50) GPR84FFAR1MAPTFAAHFFAR4
SCHEMBL11785027 0.79 GPR84 (0.50) GPR84FFAR1MAPTFAAHFFAR4
SCHEMBL11778914 0.79 GPR84 (0.50) GPR84FFAR1MAPTFAAHFFAR4
SCHEMBL11784604 0.79 GPR84 (0.50) GPR84FFAR1MAPTFAAHFFAR4
SCHEMBL6468137 0.79 GPR84 (0.50) GPR84FFAR1MAPTFAAHFFAR4
SCHEMBL11782858 0.79 GPR84 (0.50) GPR84FFAR1MAPTFAAHFFAR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113302238-A Polyvinyl alcohol resin film 株式会社爱赛璐 2021-08-24 CN claimed
CN-116997318-A Emulsified hair styling composition 株式会社漫丹 2023-11-03 CN disclosed
CN-112638355-A Cosmetic and cleaning product 株式会社资生堂 2021-04-09 CN disclosed
US-6582687-B1 Skin cleanser containing an alkali salt of N- acylamino acid and maltitolhydroxy aliphatic ether, or a hydroxy ether carboxylic acid-based anionic surfactant, or polyethylene powder, as well as water and an organic acid. Also, SHISEIDO COMPANY, LTD. (JP) 2003-06-24 US disclosed
EP-1000606-A2 Weak acid skin cleanser containing an alkali salt of N-acyl-amino acid SHISEIDO COMPANY LIMITED (JP) 2000-05-17 EP disclosed