SCHEMBL7186471

SCHEMBL7186471

CCC(C)Oc1ccc([S+](c2ccc(OC(C)CC)cc2)c2ccc(OC(C)CC)cc2)cc1.Cc1ccc(S(=O)(=O)[O-])cc1

nearest known ligand 0.39

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 1/20 0.39
HTT P42858 3/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
ALDH1A1 P00352 1/20 0.37
GAA P10253 1/20 0.37
ACACB O00763 2/20 0.36
CA2 P00918 3/20 0.35
CA12 O43570 1/20 0.35
CA9 Q16790 1/20 0.35
CA1 P00915 2/20 0.35
FFAR4 Q5NUL3 1/20 0.35
LMNA P02545 2/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
MAPK1 P28482 1/20 0.35
THPO P40225 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
KMT2A Q03164 1/20 0.34
CNR1 P21554 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7797789 0.95 CNR2 (0.44) CNR2HTTSMN1; SMN2ALDH1A1LMNA
SCHEMBL7804668 0.95 CNR2 (0.44) CNR2HTTSMN1; SMN2ALDH1A1LMNA
SCHEMBL13465024 0.84 GAA (0.55) CNR2HTTSMN1; SMN2ALDH1A1GAA
Trifluoromethanesulfonic Acid SCHEMBL7191675 0.82 ACACB (0.36) ACACBPTGDRPTGS1PTGS2
SCHEMBL7172563 0.81 CNR2 (0.43) CNR2HTTSMN1; SMN2ALDH1A1CA12
SCHEMBL8263616 0.78 ACHE (0.42) ALDH1A1ACACBCYP3A4KMT2A
SCHEMBL13064360 0.78 ACHE (0.42) ALDH1A1ACACBCYP3A4KMT2A
SCHEMBL2966006 0.78 GAA (0.52) SMN1; SMN2ALDH1A1GAACA2CA12
SCHEMBL25513374 0.78 ACHE (0.42) ALDH1A1ACACBCYP3A4KMT2A
Trifluoromethanesulfonic Acid SCHEMBL7805711 0.77 MAPT (0.38) HTTACACBLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6541179-B2 A chemically amplified, positive resist comprising a sulfonium salt compound as photoacid generator, a base resin containing a monomer having alicyclic structure, and a solvent; heat treatment and exposure SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-04-01 US disclosed
US-20010033990-A1 Resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-10-25 US disclosed