SCHEMBL2966006

SCHEMBL2966006

Cc1ccc(S(=O)(=O)[O-])cc1.Cc1ccc([S+](c2ccc(C)cc2)c2ccc(C)cc2)cc1

nearest known ligand 0.52

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.52
CA1 P00915 3/20 0.48
CA2 P00918 3/20 0.48
CA12 O43570 1/20 0.48
CA3 P07451 1/20 0.48
CA6 P23280 1/20 0.48
CA5A P35218 1/20 0.48
CA7 P43166 1/20 0.48
CA9 Q16790 1/20 0.48
CA5B Q9Y2D0 1/20 0.48
TLR9 Q9NR96 1/20 0.46
SMN1; SMN2 Q16637 2/20 0.45
ALDH1A1 P00352 3/20 0.43
CYP3A4 P08684 3/20 0.43
LMNA P02545 2/20 0.43
CYP2C9 P11712 2/20 0.43
CYP2C19 P33261 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
MMP1 P03956 1/20 0.43
MMP2 P08253 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2964104 0.92 CA12 (0.46) GAACA1CA2CA12CA3
SCHEMBL3144525 0.92 CA12 (0.46) GAACA1CA2CA12CA3
SCHEMBL2955936 0.92 GAA (0.46) GAACA1CA2CA12CA3
SCHEMBL503949 0.90 ACHE (0.48) GAACA1CA2CA12CA3
SCHEMBL8862175 0.90 ACHE (0.48) GAACA1CA2CA12CA3
SCHEMBL2964006 0.90 ACHE (0.48) GAACA1CA2CA12CA3
SCHEMBL2962482 0.90 GAA (0.45) GAACA1CA2CA12CA3
SCHEMBL2284306 0.90 ACHE (0.48) GAACA1CA2CA12CA3
SCHEMBL64189 0.90 CA12 (0.47) GAACA1CA2CA12CA3
SCHEMBL7133269 0.90 CA12 (0.47) GAACA1CA2CA12CA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed
US-6280902-B1 RESIN CONVERTED TO ALKALI SOLUBLE TO ALKALI INSOLUBLE OR ALKALI SLIGHTLY ACID SOLUBLE, AN ACID GENERATOR AND NITROGEN CYCLIC COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-28 US disclosed
EP-1058153-A1 Positive working photoresist compositions SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-12-06 EP disclosed