Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL4581035 | 1.00 | — | — | |
| Sulfuric Acid SCHEMBL64517 | 1.00 | — | — | |
| Sulfuric Acid SCHEMBL9613884 | 1.00 | CA5A (0.75) | — | |
| Sulfuric Acid SCHEMBL28243354 | 1.00 | CA5A (0.75) | — | |
| Sulfuric Acid SCHEMBL4218936 | 1.00 | CA5A (0.75) | — | |
| Sulfuric Acid SCHEMBL158844 | 1.00 | CA5A (0.75) | — | |
| Sulfuric Acid SCHEMBL23189440 | 1.00 | CA5A (0.75) | — | |
| Sulfuric Acid SCHEMBL5929426 | 0.94 | — | — | |
| Sulfuric Acid SCHEMBL9679289 | 0.94 | — | — | |
| Sulfuric Acid SCHEMBL21724469 | 0.94 | CA5A (0.67) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1081471-A | Extract the method for gold and silver with thiocarbamide | XI AN METALLURG BUILDING COLLE (CN) | 1994-02-02 | — | — | CN | claimed |
| EP-0068634-B1 | A PROCESS OF MAKING IRON (III) HEXACYANOFERRATE (II) AND TO IRON (III) HEXACYANOFERRATE (II) MADE THEREBY | SEIKO INSTRUMENTS & ELECTRONICS LTD. (JP) | 1985-05-02 | — | — | EP | claimed |
| EP-0068634-A1 | A process of making iron (III) hexacyanoferrate (II) and to iron (III) hexacyanoferrate (II) made thereby | SEIKO INSTRUMENTS & ELECTRONICS LTD. (JP) | 1983-01-05 | — | — | EP | claimed |
| CN-116636620-A | Black egg white peptide composition and application thereof | 南昌大学 | 2023-08-25 | — | — | CN | disclosed |
| US-6589912-B2 | Composition comprises at least one semiconductor photocatalyst as active ingredient, may further comprises at least one carbonate and/or hydrogencarbonate; used as photosynthesis accelerator, accelerates water decomposition | KAWAI HIROSHI (JP) | 2003-07-08 | — | — | US | disclosed |
| US-20020137632-A1 | Composition for being sprayed on foliage of plant and use of the same | KAWAI HIROSHI (JP) | 2002-09-26 | — | — | US | disclosed |
| EP-1216616-A1 | Composition for being sprayed on foliage of plant and use of the same | Kawai, Hiroshi (JP) | 2002-06-26 | — | — | EP | disclosed |
| EP-1017884-A2 | ELECTRO-PLATING PROCESS | Metal Technology, Inc. (US) | 2000-07-12 | — | — | EP | disclosed |
| WO-1999015714-A2 | ELECTRO-PLATING PROCESS | METAL TECHNOLOGY, INC. (US) | 1999-04-01 | — | — | WO | disclosed |
| EP-0293917-B1 | COLOR PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL AND METHOD OF DEVELOPING THE SAME | FUJI PHOTO FILM CO., LTD. (JP) | 1993-09-01 | — | — | EP | disclosed |
| US-4960689-A | SILVER HALIDE EMULSION LAYER CONTAINING A SENSITIZING CYANINE DYE | FUJI PHOTO FILM CO., LTD. (JP) | 1990-10-02 | — | — | US | disclosed |
| US-4952491-A | LOW FOG AND HIGH SPECTRAL SENSITIVITY; RAPID PROCESSING; CRYSTAL HABIT CONTROL | FUJI PHOTO FILM CO., LTD. (JP) | 1990-08-28 | — | — | US | disclosed |
| EP-0293917-A2 | Color photographic light-sensitive material and method of developing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1988-12-07 | — | — | EP | disclosed |