SCHEMBL7196206

SCHEMBL7196206

C=C(CCC)c1cccc2ccccc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTK2B Q14289 1/20 0.49
L3MBTL1 Q9Y468 1/20 0.49
MEN1 O00255 4/20 0.47
KMT2A Q03164 4/20 0.47
ALDH1A1 P00352 3/20 0.47
MAPT P10636 3/20 0.47
HPGD P15428 3/20 0.47
MAPK1 P28482 3/20 0.47
KDM4E B2RXH2 2/20 0.47
GMNN O75496 2/20 0.47
LMNA P02545 2/20 0.47
POLB P06746 2/20 0.47
BLM P54132 2/20 0.47
PMP22 Q01453 2/20 0.47
NPSR1 Q6W5P4 2/20 0.47
CMKLR1 Q99788 2/20 0.47
TDP1 Q9NUW8 2/20 0.47
CYP1A2 P05177 2/20 0.47
CYP2C9 P11712 2/20 0.47
TSHR P16473 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30220431 0.90 CNR2 (0.48) PTK2BL3MBTL1MEN1KMT2AALDH1A1
SCHEMBL21385039 0.88 CNR2 (0.49) PTK2BL3MBTL1CYP2C9CNR2CNR1
SCHEMBL2098307 0.86 PTK2B (0.50) PTK2BL3MBTL1MEN1KMT2AALDH1A1
SCHEMBL10644627 0.83 TP53 (0.39) L3MBTL1KMT2AALDH1A1HPGDMAPK1
SCHEMBL11497772 0.80 NR4A1 (0.56) PTK2BL3MBTL1MEN1KMT2AALDH1A1
SCHEMBL5011022 0.80 MEN1 (0.50) PTK2BL3MBTL1MEN1KMT2AALDH1A1
SCHEMBL20398171 0.80 L3MBTL1 (0.52) PTK2BL3MBTL1MEN1KMT2AALDH1A1
SCHEMBL13963143 0.78 PTPN1 (0.61) PTK2BL3MBTL1MEN1KMT2AALDH1A1
SCHEMBL10581635 0.78 PTK2B (0.50) PTK2BL3MBTL1MEN1KMT2AALDH1A1
SCHEMBL4820532 0.78 MEN1 (0.49) MEN1KMT2AALDH1A1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11970562-B2 Retardation film and production method for retardation film ZEON CORPORATION (JP) 2024-04-30 US disclosed
EP-3637159-B1 RETARDATION FILM AND PRODUCTION METHOD ZEON CORP (JP) 2024-01-10 EP disclosed
US-20230241829-A1 METHOD FOR PRODUCING A PHASE DIFFERENCE FILM ZEON CORPORATION (JP) 2023-08-03 US disclosed
US-20230202090-A1 METHOD FOR PRODUCING A PHASE DIFFERENCE FILM ZEON CORPORATION (JP) 2023-06-29 US disclosed
EP-3633424-B1 RETARDATION FILM AND PRODUCTION METHOD ZEON CORP (JP) 2023-04-19 EP disclosed
CN-113167954-B Optical film, phase difference film, and method for producing same 日本瑞翁株式会社 2023-03-17 CN disclosed
CN-115629437-A Retardation film and method for producing same 日本瑞翁株式会社 2023-01-20 CN disclosed
EP-3633425-B1 RETARDATION FILM AND PRODUCTION METHOD ZEON CORP (JP) 2023-01-18 EP disclosed
CN-111886524-B Retardation film and method for producing retardation film 日本瑞翁株式会社 2022-07-12 CN disclosed
CN-111868583-B Retardation film and method for producing retardation film 日本瑞翁株式会社 2022-05-31 CN disclosed
EP-3637159-A1 RETARDATION FILM AND PRODUCTION METHOD Zeon Corporation (JP) 2020-04-15 EP disclosed
EP-3633425-A1 RETARDATION FILM AND PRODUCTION METHOD Zeon Corporation (JP) 2020-04-08 EP disclosed
EP-3633424-A1 RETARDATION FILM AND PRODUCTION METHOD Zeon Corporation (JP) 2020-04-08 EP disclosed
CN-110709737-A Retardation film and method for producing same 日本瑞翁株式会社 2020-01-17 CN disclosed
CN-110678787-A Retardation film and method for producing same 日本瑞翁株式会社 2020-01-10 CN disclosed
CN-110651207-A Retardation film and method for producing same 日本瑞翁株式会社 2020-01-03 CN disclosed
WO-2019181892-A1 RETARDATION FILM AND PRODUCTION METHOD FOR RETARDATION FILM 日本ゼオン株式会社 2019-09-26 WO disclosed
WO-2019181893-A1 RETARDATION FILM AND PRODUCTION METHOD FOR RETARDATION FILM 日本ゼオン株式会社 2019-09-26 WO disclosed
US-6534595-B2 Blend of thermosetting resin, decomposable resin and solvent SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-03-18 US disclosed
US-20010038887-A1 Coating solution for forming porous organic film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-11-08 US disclosed