SCHEMBL7203428

SCHEMBL7203428

CCC(C)(C)c1cc(C(C)c2cc(C(C)(C)CC)cc(C(C)(C)CC)c2C=CC(=O)O)c(C=CC(=O)O)c(C(C)(C)CC)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRA P19793 5/20 0.41
PPARG P37231 5/20 0.41
RARG P13631 4/20 0.41
RARA P10276 1/20 0.38
RARB P10826 1/20 0.38
RXRB P28702 1/20 0.38
RXRG P48443 1/20 0.38
ALDH1A1 P00352 3/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
MAPK1 P28482 2/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
KDM4E B2RXH2 3/20 0.32
ESR1 P03372 1/20 0.31
HTT P42858 1/20 0.31
CA12 O43570 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA4 P22748 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL557319 0.94 RXRA (0.38) RXRAPPARGRARGRARARARB
SCHEMBL7200672 0.81 CYP3A4 (0.37) RXRAPPARGRARGRARARARB
SCHEMBL7200632 0.81 RXRA (0.38) RXRAPPARGRARGRARARARB
SCHEMBL18546392 0.80 RARG (0.32) RXRAPPARGRARG
SCHEMBL7132921 0.78 ATG4B (0.34) RXRAPPARGRARGALDH1A1SMN1; SMN2
SCHEMBL3675049 0.77 CYP1A2 (0.31) RXRAPPARGRARG
Acrylic Acid SCHEMBL6447856 0.76 RXRA (0.39) RXRAPPARGRARGRARARARB
SCHEMBL6899040 0.76 RXRA (0.38) RXRAPPARGRARGRARARARB
SCHEMBL4145596 0.76 RXRA (0.35) RXRAPPARGRARGRARARARB
SCHEMBL4145601 0.76 RXRA (0.35) RXRAPPARGRARGRARARARB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6525120-B2 Stabilization using bisphenol ester SUMITOMO CHEMICAL CO., LTD. (JP) 2003-02-25 US disclosed
US-20020002249-A1 Polymer composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-03 US disclosed