Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL4410247 | 0.86 | KMT2A (0.36) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL65803 | 0.76 | KMT2A (0.39) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL6549524 | 0.76 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL31276619 | 0.76 | PSEN1 (0.36) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL516028 | 0.76 | KMT2A (0.37) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL6140981 | 0.75 | CA1 (0.37) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL6140329 | 0.74 | KMT2A (0.35) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL515932 | 0.73 | CA1 (0.40) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL6821487 | 0.72 | CA1 (0.34) | KMT2A | |
| SCHEMBL685945 | 0.71 | KMT2A (0.42) | KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6602647-B2 | Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group | NEC CORPORATION (JP) | 2003-08-05 | — | — | US | disclosed |
| US-20020045122-A1 | Sulfonium salt compound and resist composition and pattern forming method using the same | NEC CORPORATION | 2002-04-18 | — | — | US | disclosed |
| EP-1113334-A1 | Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition | NEC CORPORATION (JP) | 2001-07-04 | — | — | EP | disclosed |