Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | CA4 | P22748 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5367225 | 0.86 | KMT2A (0.32) | KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL65803 | 0.85 | KMT2A (0.39) | KMT2ACA1CA2CA4MAPT | |
| SCHEMBL5353043 | 0.85 | CA2 (0.31) | KMT2ACA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL4165039 | 0.84 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6140981 | 0.84 | CA1 (0.37) | KMT2ACA1CA2CA4MAPT | |
| SCHEMBL686045 | 0.83 | KMT2A (0.45) | KMT2ACA1CA2CA4MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL6140329 | 0.82 | KMT2A (0.35) | KMT2ACA1CA2CA4 | |
| Trifluoromethanesulfonic Acid SCHEMBL4410247 | 0.82 | KMT2A (0.36) | KMT2ACA1CA2CA4 | |
| Trifluoromethanesulfonic Acid SCHEMBL515932 | 0.81 | CA1 (0.40) | KMT2ACA1CA2CA4MAPT | |
| SCHEMBL8169160 | 0.80 | KMT2A (0.39) | KMT2ACA1CA2CA4MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 295 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0745633-B1 | Si containing high molecular compound and photosensitive resin composition | NEC CORP (JP) | 2000-08-02 | — | — | EP | claimed |
| US-5738975-A | MIXTURE CONTAINING (METH)ACRYLATE TERPOLYMER HAVING GROUP WHICH REACTS WITH AN ACID TO CONVERT POLARITY OF POLYMER, PHOTO ACID GENERATING COMPOUND, SOLVENT | NEC CORPORATION (JP) | 1998-04-14 | — | — | US | claimed |
| US-5621019-A | PHOTORESIST CONTAINING PHOTO ACID GENERATOR AND ULTRAVIOLET RADIATION TRANSPARENT ACRYLIC POLYMER HAVING BRIDGED CYCLOHYDROCARBON GROUP RESIDUE; RESOLUTION, DRY ETCH RESISTANCE | NEC CORPORATION (JP) | 1997-04-15 | — | — | US | claimed |
| EP-4747233-A2 | COMPOUNDS, COMPOSITIONS CONTAINING COMPOUNDS, AND METHODS OF MANUFACTURING RESIST MEMBRANES | Merck Patent GmbH (DE) | 2026-05-27 | — | — | EP | disclosed |
| CN-120077771-A | Curable composition for organic EL element, cured product for organic EL element, method for producing cured product for organic EL element, and polymer | JSR株式会社 | 2025-05-30 | — | — | CN | disclosed |
| WO-2025017121-A2 | COMPOUNDS, COMPOSITIONS CONTAINING COMPOUNDS, AND METHODS OF MANUFACTURING RESIST MEMBRANES | MERCK PATENT GMBH (DE) | 2025-01-23 | — | — | WO | disclosed |
| CN-110850680-B | Curable composition, display element, and method for forming cured film | JSR株式会社 | 2024-10-25 | — | — | CN | disclosed |
| WO-2024101411-A1 | CURABLE COMPOSITION FOR ORGANIC EL ELEMENTS, CURED PRODUCT FOR ORGANIC EL ELEMENTS AND METHOD FOR PRODUCING SAME, ORGANIC EL ELEMENT, AND POLYMER | JSR株式会社 | 2024-05-16 | — | — | WO | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11370888-B2 | Silicon-rich silsesquioxane resins | DOW SILICONES CORPORATION (US) | 2022-06-28 | — | — | US | disclosed |
| CN-107544208-B | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2022-05-31 | — | — | CN | disclosed |
| US-5866304-A | USING AN ACRYLATED ACID TERPOLYMER | NEC CORPORATION (JP) | 1999-02-02 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| US-5770346-A | BRIDGED CYCLIC HYDROCARBON GROUP-CONTAINING ACRYLATE POLYMER | NEC CORPORATION (JP) | 1998-06-23 | — | — | US | disclosed |
| US-5738975-A | MIXTURE CONTAINING (METH)ACRYLATE TERPOLYMER HAVING GROUP WHICH REACTS WITH AN ACID TO CONVERT POLARITY OF POLYMER, PHOTO ACID GENERATING COMPOUND, SOLVENT | NEC CORPORATION (JP) | 1998-04-14 | — | — | US | disclosed |
| US-5665518-A | CARBOXY-SUBSTITUTED, BRIDGED CARBOCYCLIC (METH)ACRYLATE DERIVATIVE MONOMERS; TRANSPARENCY, RESOLUTION, SOLUBILITY, AND DRY-ETCHING RESISTANCE; SEMICONDUCTORS | NEC CORPORATION (JP) | 1997-09-09 | — | — | US | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5635332-A | MIXTURE WITH ULTRAVIOLET TRANSPARENT POLYMER HAVING GROUPS WHICH ARE UNSTABLE TO ACID | NEC CORPORATION (JP) | 1997-06-03 | — | — | US | disclosed |
| US-5621019-A | PHOTORESIST CONTAINING PHOTO ACID GENERATOR AND ULTRAVIOLET RADIATION TRANSPARENT ACRYLIC POLYMER HAVING BRIDGED CYCLOHYDROCARBON GROUP RESIDUE; RESOLUTION, DRY ETCH RESISTANCE | NEC CORPORATION (JP) | 1997-04-15 | — | — | US | disclosed |
| US-5585507-A | FINENESS PATTERNS | NEC CORPORATION (JP) | 1996-12-17 | — | — | US | disclosed |