SCHEMBL7204990

SCHEMBL7204990

C=CN1CCC(CC)(CC)C1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2730798 0.89
SCHEMBL28663583 0.79 TSHR (0.37)
SCHEMBL4973935 0.78 BDKRB2 (0.31)
SCHEMBL6154299 0.77
SCHEMBL632711 0.74
SCHEMBL18289466 0.73
SCHEMBL3020995 0.72 BDKRB2 (0.30)
SCHEMBL6732393 0.71 CHRM2 (0.35)
SCHEMBL29044294 0.71
SCHEMBL14739686 0.70 DUT (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116270259-A Water-in-oil type emulsified sunscreen cosmetic 株式会社资生堂 2023-06-23 CN disclosed
CN-116270260-A Water-in-oil type emulsified sunscreen cosmetic 株式会社资生堂 2023-06-23 CN disclosed
CN-109069357-B Oil-in-water type emulsion cosmetic 株式会社资生堂 2022-08-30 CN disclosed
US-6602804-B2 Dielectric, polymer blend SHIPLEY COMPANY, L.L.C. 2003-08-05 US disclosed
US-6420441-B1 DISPERSING REMOVABLE CROSSLINKED POLYMER POROGENS IN A POLYSILOXANE, CURING, AND HEATING TO REMOVE POROGEN; LOW DIELECTRIC CONSTANT; HIGH POROSITY; INSULATION MATERIALS SHIPLEY COMPANY, L.L.C. 2002-07-16 US disclosed