SCHEMBL7207574

SCHEMBL7207574

C=C(C)C(=O)C(CCO)(CC(=O)O)C(=O)O

nearest known ligand 0.34

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.34
TSHR P16473 1/20 0.34
CYP2C19 P33261 1/20 0.34
HIF1A Q16665 1/20 0.34
FFAR1 O14842 1/20 0.31
CPT2 P23786 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HMGCR P04035 1/20 0.31
CHRM1 P11229 1/20 0.31
TBXA2R P21731 1/20 0.31
ADRA1A P35348 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6245698 0.81 CYP2D6 (0.37) CYP2D6TSHRCYP2C19HIF1AALDH1A1
SCHEMBL2394487 0.76 CYP2D6 (0.33) CYP2D6TSHRCYP2C19HIF1AALDH1A1
SCHEMBL2521160 0.70 ARG2 (0.35) TSHRALDH1A1
SCHEMBL16418496 0.69 CYP2C19 (0.44) CYP2D6TSHRCYP2C19HIF1AFFAR1
SCHEMBL28243170 0.68 CYP2C19 (0.44) CYP2D6TSHRCYP2C19HIF1AFFAR1
SCHEMBL7770808 0.68 CYP2C19 (0.48) CYP2D6TSHRCYP2C19HIF1AFFAR1
SCHEMBL810647 0.67 TET2 (0.31)
SCHEMBL28312 0.67 ALDH1A1 (0.53) CYP2D6TSHRCYP2C19HIF1AFFAR1
SCHEMBL22283924 0.66 ALDH1A1 (0.37) TSHRALDH1A1
SCHEMBL28849282 0.66 TDP1 (0.31) TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3884922-B1 DENTAL POLYMERIZABLE COMPOSITION G C DENTAL IND CORP (JP) 2025-06-18 EP disclosed
US-20220334474-A1 PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2022-10-20 US disclosed
US-11413222-B2 Dental polymerizable composition GC CORPORATION (JP) 2022-08-16 US disclosed
US-20210298999-A1 DENTAL POLYMERIZABLE COMPOSITION GC CORPORATION (JP) 2021-09-30 US disclosed
EP-3884922-A1 DENTAL POLYMERIZABLE COMPOSITION GC Corporation (JP) 2021-09-29 EP disclosed
EP-1037111-B1 Ultraviolet curable resin composition and photo solder resist ink using the same GOO CHEMICAL CO LTD (JP) 2003-10-22 EP disclosed
US-6465540-B1 POLYMER CONTAINING EPOXIZED ETHYLENICALLY UNSATURATE, DIACRY-LATED POLYETHER AND POLYBASIC ANHYDRIDE WITH SUCH AS A CRESOL NOVOLAC EPOXY RESIN AND PHOTOINITIATOR; DILUTE ALKALI DEVE-LOPABLE; PROTECTIVE FILMS FOR COLOR FILTERS; PRINTED CIRCUITS GOO CHEMICAL CO., LTD. (JP) 2002-10-15 US disclosed
EP-1037111-A1 Ultraviolet curable resin composition and photo solder resist ink using the same Goo Chemical Co., Ltd. (JP) 2000-09-20 EP disclosed