Dimethylamine

Dimethylamine

SCHEMBL7207623

CCCC1([Zr]C2=C(C)C(C)=C(C)C2(C)C)C=Cc2ccccc21.CNC

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL6067109 0.79
SCHEMBL17023010 0.75 KDM4E (0.35)
Hydrochloric Acid SCHEMBL20474439 0.74 OXTR (0.32)
Dimethylamine SCHEMBL7211211 0.74
Hydrochloric Acid SCHEMBL137751 0.73 KDM4E (0.34)
Hydrochloric Acid SCHEMBL5603096 0.71 OXTR (0.30)
SCHEMBL7207618 0.70
Hydrochloric Acid SCHEMBL5600684 0.69
Hydrochloric Acid SCHEMBL5600705 0.69
Hydrochloric Acid SCHEMBL5601749 0.68 OXTR (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6610872-B1 Zirconim complex containing a dialkylaminoalkylcyclopenta-dienyl or indenyl group and a hydorcarbon cyclopentadienyl group DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2003-08-26 US disclosed
US-6140448-A Process for preparing polysilane by catalytic dehydrogenative condensation of organosilane and metal complex catalyst therefor DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2000-10-31 US disclosed