Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1B1 | P15121 | 1/20 | 0.41 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.39 |
| ▸ | PPARG | P37231 | 7/20 | 0.39 |
| ▸ | PPARD | Q03181 | 7/20 | 0.39 |
| ▸ | PPARA | Q07869 | 7/20 | 0.39 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.39 |
| ▸ | TSHR | P16473 | 4/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | TLR2 | O60603 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | FABP4 | P15090 | 2/20 | 0.39 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.39 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | PDE4A | P27815 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9619111 | 0.82 | ALDH1A1 (0.43) | AKR1B1GPR84PPARGPPARDPPARA | |
| SCHEMBL9550773 | 0.80 | ALDH1A1 (0.41) | GPR84PPARGPPARDPPARAHDAC11 | |
| SCHEMBL3052145 | 0.78 | NAAA (0.50) | GPR84TSHRALDH1A1SLC22A6SLC22A8 | |
| SCHEMBL31055575 | 0.78 | ALDH1A1 (0.40) | GPR84PPARGPPARDPPARAHDAC11 | |
| SCHEMBL2119448 | 0.78 | NAAA (0.50) | GPR84TSHRALDH1A1SLC22A6SLC22A8 | |
| SCHEMBL25211926 | 0.78 | NAAA (0.50) | GPR84TSHRALDH1A1SLC22A6SLC22A8 | |
| SCHEMBL25218755 | 0.78 | NAAA (0.50) | GPR84TSHRALDH1A1SLC22A6SLC22A8 | |
| SCHEMBL25198827 | 0.78 | NAAA (0.50) | GPR84TSHRALDH1A1SLC22A6SLC22A8 | |
| SCHEMBL25196488 | 0.78 | NAAA (0.50) | GPR84TSHRALDH1A1SLC22A6SLC22A8 | |
| SCHEMBL21749894 | 0.77 | NAAA (0.48) | GPR84TSHRALDH1A1SLC22A6SLC22A8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0251059-B1 | PHOTOSENSITIVE REGISTRATION MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-07-29 | — | — | EP | claimed |
| EP-0153682-B1 | RADIATION-SENSITIVE COMPOSITION WITH ACID CLEAVABLE COMPOUNDS | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-05-02 | — | — | EP | claimed |
| US-4678737-A | Radiation-sensitive composition and recording material based on compounds which can be split by acid | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-07-07 | — | — | US | claimed |
| EP-0049840-B1 | PROCESS FOR THE PRODUCTION OF RELIEF COPIES | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-01-09 | — | — | EP | claimed |
| US-RE38256-E1 | Safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-09-23 | — | — | US | disclosed |
| EP-0665960-B1 | IMAGING MEDIUM AND PROCESS | POLAROID CORP (US) | 1998-08-19 | — | — | EP | disclosed |
| EP-0589309-B1 | Use of a positive-working presensitized plate for making lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 1998-01-21 | — | — | EP | disclosed |
| US-5691101-A | NONTOXIC PHOTORESISTS FOR MANUFACTURE OF CATHODE RAY TUBES AND IMAGE PICKUP DEVICES, ACID GENERATING COMPOUND WHICH CATALYZES CROSSLINKING OR DECOMPOSITION OF RESIN | KABUSHIKI KAISHA TOSHIBA (JP) | 1997-11-25 | — | — | US | disclosed |
| EP-0474010-B1 | Developer composition for irradiated radiation-sensitive positive and negative working, as well as reversible reprographic layers and process for developing such layers | AGFA GEVAERT AG (DE) | 1997-11-05 | — | — | EP | disclosed |
| EP-0432609-B1 | Process for the formation of negative copies | HOECHST AG (DE) | 1995-11-08 | — | — | EP | disclosed |
| EP-0263434-B1 | Photosensitive composition and a photosensitive registration material prepared therefrom | HOECHST AG (DE) | 1994-04-13 | — | — | EP | disclosed |
| EP-0589309-A1 | Positive-working presensitized plate for use in making lithographic printing plate | Fuji Photo Film Co., Ltd. (JP) | 1994-03-30 | — | — | EP | disclosed |
| US-4387152-A | Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-06-07 | — | — | US | disclosed |
| EP-0078981-A2 | Light-sensitive composition and light-sensitive copy material made therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-05-18 | — | — | EP | disclosed |
| EP-0078980-A1 | Photosensitive composition and photosensitive copying material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-05-18 | — | — | EP | disclosed |
| EP-0059250-A1 | Light-sensitive composition and copying material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-09-08 | — | — | EP | disclosed |
| EP-0050802-A2 | Light-sensitive composition, light-sensitive copying material made therefrom, and process for producing a printing forme from this material | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-05-05 | — | — | EP | disclosed |
| EP-0049840-A2 | Process for the production of relief copies | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-04-21 | — | — | EP | disclosed |
| EP-0042562-A2 | Positive-working radiation-sensitive composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-12-30 | — | — | EP | disclosed |
| US-4250247-A | COMPRISING AN ACID-FORMING COMPOUND AND A COMPOUND HAVING AS AN ACID-CLEAVABLE GROUP AN N-ACYLIMINOCARBONATE; RELIEF IMAGES; OFFSET PRINTING | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-10 | — | — | US | disclosed |