SCHEMBL721349

SCHEMBL721349

O=C(O)C(O)C(O)(C(=O)O)C(=O)O

nearest known ligand 0.48

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CPT2 P23786 1/20 0.48
ACLY P53396 1/20 0.48
TSHR P16473 3/20 0.37
ALDH1A1 P00352 3/20 0.35
TP53 P04637 2/20 0.35
OR51E2 Q9H255 1/20 0.30
LMNA P02545 1/20 0.30
THRB P10828 1/20 0.30
RECQL P46063 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1161008 0.84 CPT2 (0.41) CPT2ACLYTSHRALDH1A1TP53
SCHEMBL3971019 0.84 CPT2 (0.41) CPT2ACLYTSHR
SCHEMBL30050299 0.84 CPT2 (0.41) CPT2ACLYTSHRALDH1A1TP53
Water SCHEMBL28115838 0.82 CPT2 (0.40) CPT2ACLYTSHRALDH1A1TP53
SCHEMBL15208227 0.80 CPT2 (0.39) CPT2ACLYTSHRALDH1A1TP53
SCHEMBL31119117 0.80 CPT2 (0.39) CPT2ACLYTSHRALDH1A1TP53
SCHEMBL28818879 0.78 CPT2 (0.38) CPT2ACLYLMNA
SCHEMBL29249799 0.78 CPT2 (0.38) CPT2ACLYTSHRALDH1A1TP53
SCHEMBL9345955 0.77 CPT2 (0.36) CPT2ACLYTSHRALDH1A1
SCHEMBL10620607 0.75 CPT2 (0.48) CPT2ACLYTSHRALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11649377-B2 Polishing liquid, polishing liquid set and polishing method RESONAC CORPORATION (JP) 2023-05-16 US disclosed
US-20220135422-A1 TITANIUM OXIDE PRODUCTION METHOD SHOWA DENKO K.K. (JP) 2022-05-05 US disclosed
EP-3904293-A1 TITANIUM OXIDE PRODUCTION METHOD Showa Denko K.K. (JP) 2021-11-03 EP disclosed
CN-113260594-A Method for producing titanium oxide 昭和电工株式会社 2021-08-13 CN disclosed
US-20120048295-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2012-03-01 US disclosed
JP-2007238953-A BINDER FOR PRINTING INK AND PRINTING INK DAINIPPON INK & CHEM INC 2007-09-20 JP disclosed
CN-1223633-C Polyacetal resin composition POLYPLASTICS CO (JP) 2005-10-19 CN disclosed
EP-1000966-B1 Chlorinated vinyl chloride resin composition KANEKA CORP (JP) 2005-02-02 EP disclosed
EP-1303564-B1 STABILISER SYSTEM COMPRISING HYDROXYACIDS AKZO NOBEL NV (NL) 2004-03-10 EP disclosed
US-20030018112-A1 Chlorinated vinyl chloride resin composition KANEKA CORPORATION (JP) 2003-01-23 US disclosed
CN-1392195-A Polyacetal resin composition POLYPLASTICS CO (JP) 2003-01-22 CN disclosed
US-6469079-B1 HAVING EXCELLENT THERMAL STABILITY IN MOLDING AND TO EXTRUDED PIPES OBTAINED THEREFROM; CHLORINATED VINYL CHLORIDE RESIN, ZEOLITE, AN IMPACT MODIFIER, ORGANOTIN HEAT STABILIZER, AND LUBRICANT KANEKA CORPORATION (JP) 2002-10-22 US disclosed
US-20020032259-A1 Stabliser system comprising hydroxyacids AKZO NOBEL N.V. (NL) 2002-03-14 US disclosed
EP-1000966-A1 Chlorinated vinyl chloride resin composition KANEKA CORPORATION (JP) 2000-05-17 EP disclosed