⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11066238 | 0.84 | TDP1 (0.40) | — | |
| SCHEMBL723426 | 0.83 | — | — | |
| SCHEMBL724298 | 0.79 | MAPT (0.44) | — | |
| SCHEMBL2605560 | 0.79 | MGAM (0.38) | — | |
| SCHEMBL11078575 | 0.77 | — | — | |
| SCHEMBL6168846 | 0.77 | — | — | |
| SCHEMBL1455011 | 0.76 | — | — | |
| SCHEMBL10946938 | 0.76 | TSHR (0.36) | — | |
| Acetic Acid SCHEMBL28316603 | 0.76 | ALDH1A1 (0.33) | — | |
| SCHEMBL13241894 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3877459-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | Momentive Performance Materials Inc. (US) | 2021-09-15 | — | — | EP | disclosed |
| EP-2609468-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM Corporation (JP) | 2013-07-03 | — | — | EP | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| WO-2012026622-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| CN-101872116-A | Produce the photoresist method of patterning | SUMITOMO CHEMICAL CO | 2010-10-27 | — | — | CN | disclosed |
| CN-101872117-A | Produce the photoresist method of patterning | SUMITOMO CHEMICAL CO | 2010-10-27 | — | — | CN | disclosed |
| EP-1429185-B1 | ETCHING METHOD AND USE OF A COMPOSITION FOR FORMING ETCHING PROTECTIVE LAYER | AZ ELECTRONIC MATERIALS USA (US) | 2009-05-13 | — | — | EP | disclosed |
| CN-1903942-A | Radiation sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2007-01-31 | — | — | CN | disclosed |
| US-7141177-B2 | Etching method and composition for forming etching protective layer | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-11-28 | — | — | US | disclosed |
| US-20040238486-A1 | Etching method and composition for forming etching protective layer | MERCK PATENT GMBH (DE) | 2004-12-02 | — | — | US | disclosed |
| EP-1429185-A1 | ETCHING METHOD AND COMPOSITION FOR FORMING ETCHING PROTECTIVE LAYER | Clariant International Ltd. (CH) | 2004-06-16 | — | — | EP | disclosed |
| CN-1070689-A | Carbamide ring tanning agent and vegetable tanning agent are in conjunction with the method for tanning bottom leather | BATU QING (CN) | 1993-04-07 | — | — | CN | disclosed |
| US-4515835-A | HYDROXY-FUNCTIONAL ADDITION POLYMER, REACTIVE DILUENT | ROHM AND HAAS COMPANY (US) | 1985-05-07 | — | — | US | disclosed |