SCHEMBL7214927

SCHEMBL7214927

c1ccc2c(B3OCCCO3)cccc2c1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.36
CYP2A6 P11509 4/20 0.36
HSD17B10 Q99714 4/20 0.36
TSHR P16473 3/20 0.36
TDP1 Q9NUW8 1/20 0.36
CYP1A2 P05177 5/20 0.34
HPGD P15428 2/20 0.34
CYP3A4 P08684 1/20 0.34
KEAP1 Q14145 1/20 0.34
HPRT1 P00492 1/20 0.33
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA9 Q16790 1/20 0.32
MMP3 P08254 1/20 0.32
HDAC8 Q9BY41 1/20 0.32
KDM1A O60341 1/20 0.32
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
HIF1A Q16665 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3199027 0.92 ALDH1A1 (0.39) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL30391672 0.92 ALDH1A1 (0.39) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL4560305 0.82 ALDH1A1 (0.31) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL18124824 0.81 CA1 (0.39) CA12CA1CA2CA9
SCHEMBL14983522 0.78 TRPM4 (0.38) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL14241619 0.77 ALDH1A1 (0.43) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL13855223 0.77 NISCH (0.36) ALDH1A1HSD17B10TSHRTDP1HPGD
SCHEMBL2270952 0.77 ALDH1A1 (0.35) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL14983514 0.77 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRTDP1CYP1A2
SCHEMBL10018676 0.76 CA1 (0.33) ALDH1A1CA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
EP-0974595-B1 PROCESS FOR PRODUCING BORON COMPOUNDS SHOWA DENKO KK (JP) 2003-10-01 EP disclosed
US-6140537-A REACTING AN ORGANIC OXYBORON COMPOUND WITH LITHIUM, MAGNESIUM, OR COMPOUND THEREOF; FORMING BORON ANION COMPOUND; ION EXCHANGING SHOWA DENKO K.K. (JP) 2000-10-31 US disclosed
EP-0974595-A1 PROCESS FOR PRODUCING BORON COMPOUNDS Showa Denko Kabushiki Kaisha (JP) 2000-01-26 EP disclosed