SCHEMBL7214928

SCHEMBL7214928

c1ccc2cc(B3OCCCO3)ccc2c1

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LPL P06858 1/20 0.40
LIPG Q9Y5X9 1/20 0.40
KDM4E B2RXH2 1/20 0.37
CYP2A6 P11509 6/20 0.34
CYP1A2 P05177 4/20 0.34
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
ALDH1A1 P00352 1/20 0.34
CYP3A4 P08684 1/20 0.34
HSD17B10 Q99714 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CA7 P43166 1/20 0.34
CA9 Q16790 1/20 0.34
HRH3 Q9Y5N1 1/20 0.32
CES2 O00748 1/20 0.31
CES1 P23141 1/20 0.31
CHKA P35790 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14983483 0.94 ALDH1A1 (0.36) LPLLIPGKDM4EALDH1A1CYP3A4
SCHEMBL14983443 0.92 LPL (0.42) LPLLIPGCYP2A6CYP1A2CA1
SCHEMBL14983481 0.86 ALDH1A1 (0.39) LPLLIPGCYP2A6CYP1A2CA1
SCHEMBL223577 0.79 CYP2A6 (0.44) KDM4ECYP2A6CYP1A2CA1ALDH1A1
SCHEMBL14983445 0.77 LPL (0.46) LPLLIPGCYP2A6CYP1A2CA1
SCHEMBL13136869 0.77
SCHEMBL3686725 0.76
SCHEMBL13855205 0.76 HSD17B10 (0.48) LPLLIPGKDM4ECYP2A6CYP1A2
SCHEMBL1136933 0.74 LPL (0.33) LPLLIPG
SCHEMBL14983506 0.74 CYP1A2 (0.43) KDM4ECYP2A6CYP1A2ALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
EP-0974595-B1 PROCESS FOR PRODUCING BORON COMPOUNDS SHOWA DENKO KK (JP) 2003-10-01 EP disclosed
US-6140537-A REACTING AN ORGANIC OXYBORON COMPOUND WITH LITHIUM, MAGNESIUM, OR COMPOUND THEREOF; FORMING BORON ANION COMPOUND; ION EXCHANGING SHOWA DENKO K.K. (JP) 2000-10-31 US disclosed
EP-0974595-A1 PROCESS FOR PRODUCING BORON COMPOUNDS Showa Denko Kabushiki Kaisha (JP) 2000-01-26 EP disclosed