Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 2/20 | 0.39 |
| ▸ | CACNA2D1 | P54289 | 2/20 | 0.32 |
| ▸ | CACNB3 | P54284 | 1/20 | 0.32 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.32 |
| ▸ | PGR | P06401 | 1/20 | 0.32 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.32 |
| ▸ | HTR2B | P41595 | 1/20 | 0.32 |
| ▸ | CACNA2D2 | Q9NY47 | 1/20 | 0.32 |
| ▸ | RNPEP | Q9H4A4 | 1/20 | 0.32 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.32 |
| ▸ | BIRC2 | Q13490 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7216971 | 0.86 | CTSK (0.38) | CTSKCACNA2D1CACNB3CACNA1CPGR | |
| SCHEMBL17878548 | 0.84 | CYP19A1 (0.37) | CTSKRNPEPSLC7A5BIRC2 | |
| SCHEMBL25875641 | 0.84 | CTSK (0.34) | CTSK | |
| SCHEMBL7217921 | 0.83 | CTSK (0.44) | CTSKCACNA2D1CACNB3CACNA1CPGR | |
| SCHEMBL7224912 | 0.83 | CTSK (0.39) | CTSKCACNA2D1CACNB3CACNA1CPGR | |
| SCHEMBL17515451 | 0.81 | CA1 (0.32) | — | |
| SCHEMBL7217067 | 0.80 | CTSK (0.53) | CTSK | |
| SCHEMBL12369638 | 0.80 | MAPT (0.42) | — | |
| SCHEMBL12034600 | 0.80 | — | — | |
| SCHEMBL2170393 | 0.79 | CTSK (0.39) | CTSKCACNA2D1CACNB3CACNA1CPGR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160041465-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-11 | — | — | US | disclosed |
| US-20080081290-A1 | RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080081290-A1 | RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-6667285-B1 | Branched-chain carboxylic acid monoalkyl ester with outstanding hydrolytic stability | NEW JAPAN CHEMICAL CO., LTD. (JP) | 2003-12-23 | — | — | US | disclosed |
| EP-1225213-A1 | LUBRICATING OIL FOR REFRIGERATOR, HYDRAULIC FLUID COMPOSITION FOR REFRIGERATOR AND METHOD FOR LUBRICATION OF REFRIGERATOR | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 2002-07-24 | — | — | EP | disclosed |