Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.60 |
| ▸ | ABL1 | P00519 | 3/20 | 0.60 |
| ▸ | RIN1 | Q13671 | 3/20 | 0.60 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL723615 | 0.87 | TDP1 (0.59) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL723545 | 0.85 | TDP1 (0.67) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL121703 | 0.85 | TDP1 (0.67) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL723098 | 0.82 | TDP1 (0.57) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL7992491 | 0.82 | TDP1 (0.50) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL21905182 | 0.81 | ABL1 (0.38) | TDP1ABL1RIN1GAA | |
| SCHEMBL7976768 | 0.81 | TDP1 (0.55) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL192058 | 0.80 | TDP1 (0.68) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL725117 | 0.79 | TDP1 (0.54) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL721699 | 0.78 | TDP1 (0.53) | TDP1ABL1RIN1KDM4EKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110007563-B | Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-107544208-B | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2022-05-31 | — | — | CN | disclosed |
| CN-108137478-B | Compound, composition thereof, purification method, resist pattern formation method, and amorphous film production method | 三菱瓦斯化学株式会社 | 2021-09-28 | — | — | CN | disclosed |
| CN-107924123-B | Material for lithography, method for producing same, composition for lithography, method for forming pattern, compound, resin, and method for purifying same | 学校法人关西大学 | 2021-08-06 | — | — | CN | disclosed |
| CN-107428717-B | Resist composition, resist pattern forming method, and polyphenol compound used for same | 三菱瓦斯化学株式会社 | 2021-04-23 | — | — | CN | disclosed |
| CN-107533290-B | Resist base material, resist composition, and method for forming resist pattern | 三菱瓦斯化学株式会社 | 2021-04-09 | — | — | CN | disclosed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |
| CN-106462059-B | Resist material, resist composition, and resist pattern forming method | 三菱瓦斯化学株式会社 | 2020-07-28 | — | — | CN | disclosed |
| CN-106957217-B | Polyhydric phenol compound for resist composition | 三菱瓦斯化学株式会社 | 2020-07-24 | — | — | CN | disclosed |
| CN-105319852-B | Photosensitive resin composition, protective film and element with protective film | 奇美实业股份有限公司 | 2020-06-26 | — | — | CN | disclosed |
| CN-105319845-B | Photosensitive resin composition, protective film and element with protective film | 奇美实业股份有限公司 | 2020-04-21 | — | — | CN | disclosed |
| CN-105278243-B | Photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2020-01-07 | — | — | CN | disclosed |
| US-20180004086-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF SPACER, PRODUCTION METHOD OF PROTECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2018-01-04 | — | — | US | disclosed |
| EP-2609468-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM Corporation (JP) | 2013-07-03 | — | — | EP | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| WO-2012026622-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| US-6287746-B1 | PHOTOACID GENERATOR | NEC CORPORATION (JP) | 2001-09-11 | — | — | US | disclosed |