Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.59 |
| ▸ | ABL1 | P00519 | 3/20 | 0.59 |
| ▸ | RIN1 | Q13671 | 3/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | HTT | P42858 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL723545 | 0.92 | TDP1 (0.67) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL121703 | 0.92 | TDP1 (0.67) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL721824 | 0.87 | TDP1 (0.60) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL721699 | 0.75 | TDP1 (0.53) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL11145933 | 0.73 | TDP1 (0.72) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL723474 | 0.71 | TDP1 (0.47) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL18106287 | 0.70 | TDP1 (0.58) | TDP1ABL1RIN1KDM4EKMT2A | |
| SCHEMBL196871 | 0.67 | L3MBTL1 (0.42) | KDM4EGAA | |
| SCHEMBL21905182 | 0.67 | ABL1 (0.38) | TDP1ABL1RIN1GAA | |
| SCHEMBL18106239 | 0.67 | TDP1 (0.64) | TDP1ABL1RIN1KDM4EKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2609468-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM Corporation (JP) | 2013-07-03 | — | — | EP | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| WO-2012026622-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| US-7550249-B2 | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-06-23 | — | — | US | disclosed |