SCHEMBL7219101

SCHEMBL7219101

CCCC(C)C(=O)OCCC(C)C

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA9 Q16790 1/20 0.42
ALDH1A1 P00352 3/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
KMT2A Q03164 2/20 0.41
MEN1 O00255 1/20 0.41
CYP19A1 P11511 1/20 0.39
PKM P14618 2/20 0.38
KDM4E B2RXH2 1/20 0.38
GAA P10253 1/20 0.38
TDP1 Q9NUW8 3/20 0.37
HDAC1 Q13547 2/20 0.37
HDAC2 Q92769 2/20 0.37
HDAC3 O15379 1/20 0.37
HDAC4 P56524 1/20 0.37
HDAC7 Q8WUI4 1/20 0.37
HDAC10 Q969S8 1/20 0.37
HDAC11 Q96DB2 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7223140 0.88 CA1 (0.44) CA12CA1CA2CA9ALDH1A1
SCHEMBL3905507 0.86 ALDH1A1 (0.46) CA1ALDH1A1SMN1; SMN2KMT2AMEN1
SCHEMBL7217380 0.86 CA1 (0.52) CA12CA1CA2CA9
SCHEMBL7217119 0.86 CA1 (0.38) CA1ALDH1A1SMN1; SMN2KMT2AMEN1
SCHEMBL8954891 0.84 CA12 (0.43) CA12CA1CA2CA9ALDH1A1
SCHEMBL891188 0.84 CA12 (0.43) CA12CA1CA2CA9ALDH1A1
SCHEMBL7219082 0.84 NAAA (0.41) CA1ALDH1A1SMN1; SMN2KMT2AMEN1
SCHEMBL7223410 0.84 NAAA (0.41) CA1ALDH1A1SMN1; SMN2KMT2AMEN1
SCHEMBL7223082 0.84 CA1 (0.50) CA1
SCHEMBL7217056 0.84 NAAA (0.41) CA1ALDH1A1SMN1; SMN2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11796916-B2 Pattern formation methods and photoresist pattern overcoat compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-10-24 US disclosed
CN-108803236-B Pattern forming method and photoresist pattern overcoat composition 罗门哈斯电子材料有限责任公司 2022-06-03 CN disclosed
US-20210232047-A1 PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSITIONS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2021-07-29 US disclosed
US-11003074-B2 Pattern formation methods and photoresist pattern overcoat compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2021-05-11 US disclosed
CN-110352011-A Change or enhance the flavor of food and beverage product 泰特&莱尔组分美国公司 2019-10-18 CN disclosed
CN-108803236-A Pattern forming method and photoresist pattern overcoat compositions 罗门哈斯电子材料有限责任公司 2018-11-13 CN disclosed
US-20180314155-A1 PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSITIONS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-11-01 US disclosed
CN-107403956-A Electrolyte and lithium ion battery 宁德新能源科技有限公司 2017-11-28 CN disclosed
US-6667285-B1 Branched-chain carboxylic acid monoalkyl ester with outstanding hydrolytic stability NEW JAPAN CHEMICAL CO., LTD. (JP) 2003-12-23 US disclosed
EP-1225213-A1 LUBRICATING OIL FOR REFRIGERATOR, HYDRAULIC FLUID COMPOSITION FOR REFRIGERATOR AND METHOD FOR LUBRICATION OF REFRIGERATOR NEW JAPAN CHEMICAL CO.,LTD. (JP) 2002-07-24 EP disclosed