⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4204800 | 0.79 | — | — | |
| SCHEMBL4204796 | 0.79 | — | — | |
| SCHEMBL19953184 | 0.77 | — | — | |
| SCHEMBL15290496 | 0.75 | — | — | |
| SCHEMBL9229396 | 0.75 | ALDH1A1 (0.36) | — | |
| SCHEMBL8015076 | 0.73 | — | — | |
| SCHEMBL439275 | 0.73 | — | — | |
| SCHEMBL6179801 | 0.73 | ALDH1A1 (0.39) | — | |
| SCHEMBL27519089 | 0.71 | — | — | |
| SCHEMBL4892609 | 0.71 | HCAR2 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101809502-B | Thick film resists | AZ ELECTRONIC MATERIALS USA | 2014-01-08 | — | — | CN | claimed |
| US-20210055457-A1 | COLOR FILTER MANUFACTURING METHOD, COLOR FILTER, AND RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-25 | — | — | US | disclosed |
| EP-2439070-B1 | Infrared-sensitive positive-working image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate | FUJIFILM CORP (JP) | 2019-07-17 | — | — | EP | disclosed |
| US-10336976-B2 | Photosensitive resin composition for forming cell culture substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-02 | — | — | US | disclosed |
| US-10067422-B2 | Photosensitive resin composition for forming interlayer insulating film, interlayer insulating film, and method for forming interlayer insulating film | TOKYO OHKA KOGYO CO. LTD. (JP) | 2018-09-04 | — | — | US | disclosed |
| US-20170255099-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, AND METHOD FOR FORMING INTERLAYER INSULATING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-09-07 | — | — | US | disclosed |
| US-20170137767-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING CELL CULTURE SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-05-18 | — | — | US | disclosed |
| EP-3133145-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING CELL CULTURE SUBSTRATE | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2017-02-22 | — | — | EP | disclosed |
| EP-2778783-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PROCESS FOR PRODUCING LITHOGRAPHIC PRINTING PLATE | EASTMAN KODAK CO (US) | 2016-07-27 | — | — | EP | disclosed |
| US-9250521-B2 | Lithographic printing plate precursor and a method for making a printing plate | EASTMAN KODAK COMPANY (US) | 2016-02-02 | — | — | US | disclosed |
| CN-1902245-A | LTMC polymerization of unsaturated monomers | EQUISTAR CHEM LP (US) | 2007-01-24 | — | — | CN | disclosed |
| CN-1898281-A | Hyperbranched polymer, method for producing same, and resist composition containing same | LION CORP (JP) | 2007-01-17 | — | — | CN | disclosed |
| CN-1204176-C | Methods and Compositions | AVECIA LTD (GB) | 2005-06-01 | — | — | CN | disclosed |
| CN-1146637-C | Polymer composition and core-shell elastomer used therefor | 三井化学株式会社 | 2004-04-21 | — | — | CN | disclosed |
| CN-1468281-A | Method and compositions | — | 2004-01-14 | — | — | CN | disclosed |
| CN-1314617-A | Positive sensitive flat-plate printing plate | FUJI PHOTO FILM CO LTD (JP) | 2001-09-26 | — | — | CN | disclosed |
| CN-1052022-C | Polymer composition and core-shell elastomer for use in the composition | MITSUI PETROCHEMICAL IND (JP) | 2000-05-03 | — | — | CN | disclosed |
| CN-1215069-A | Polymer composition and core-shell elastomer used therefor | MITSUI CHEMICALS INC (JP) | 1999-04-28 | — | — | CN | disclosed |
| CN-1111658-A | Polymer composition and core-shell elastomer for use in the composition | MITSUI PETROCHEMICAL IND (JP) | 1995-11-15 | — | — | CN | disclosed |
| US-3963495-A | Image-receiving element for silver salt diffusion transfer with layer of monoacrylates or monomethacrylates of polyhydric alcohols | FUJI PHOTO FILM CO., LTD. (JA) | 1976-06-15 | — | — | US | disclosed |