Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GNAI3 | P08754 | 1/20 | 0.54 |
| ▸ | GNAO1 | P09471 | 1/20 | 0.54 |
| ▸ | GNAI1 | P63096 | 1/20 | 0.54 |
| ▸ | GSR | P00390 | 1/20 | 0.48 |
| ▸ | TLR2 | O60603 | 2/20 | 0.48 |
| ▸ | NOD1 | Q9Y239 | 2/20 | 0.48 |
| ▸ | DPP8 | Q6V1X1 | 2/20 | 0.47 |
| ▸ | DPP9 | Q86TI2 | 2/20 | 0.47 |
| ▸ | DPP7 | Q9UHL4 | 2/20 | 0.47 |
| ▸ | CPB2 | Q96IY4 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | RRM1 | P23921 | 1/20 | 0.41 |
| ▸ | DPP4 | P27487 | 1/20 | 0.41 |
| ▸ | DNM1 | Q05193 | 3/20 | 0.40 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.40 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL721692 | 1.00 | GNAI3 (0.54) | GNAI3GNAO1GNAI1GSRTLR2 | |
| SCHEMBL14935740 | 1.00 | GNAI3 (0.54) | GNAI3GNAO1GNAI1GSRTLR2 | |
| Hydrochloric Acid SCHEMBL6428766 | 0.98 | GNAI3 (0.53) | GNAI3GNAO1GNAI1GSRTLR2 | |
| SCHEMBL856465 | 0.98 | GNAI3 (0.51) | GNAI3GNAO1GNAI1GSRTLR2 | |
| SCHEMBL2494020 | 0.98 | GNAI3 (0.51) | GNAI3GNAO1GNAI1GSRTLR2 | |
| Hydrochloric Acid SCHEMBL9537364 | 0.97 | GNAI3 (0.50) | GNAI3GNAO1GNAI1GSRTLR2 | |
| Hydrochloric Acid SCHEMBL10580924 | 0.97 | GNAI3 (0.50) | GNAI3GNAO1GNAI1GSRTLR2 | |
| SCHEMBL7771135 | 0.95 | GNAI3 (0.56) | GNAI3GNAO1GNAI1GSRTLR2 | |
| SCHEMBL5267100 | 0.95 | GNAI3 (0.56) | GNAI3GNAO1GNAI1GSRTLR2 | |
| SCHEMBL10614116 | 0.95 | GNAI3 (0.56) | GNAI3GNAO1GNAI1GSRTLR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2609468-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM Corporation (JP) | 2013-07-03 | — | — | EP | disclosed |
| EP-1645908-B1 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORP (JP) | 2013-01-09 | — | — | EP | disclosed |
| WO-2012026622-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| EP-1645908-A1 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-12 | — | — | EP | disclosed |
| EP-1641849-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | Symyx Technologies, Inc. (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1641848-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR Corporation (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2005003198-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORPORATION (JP) | 2005-01-13 | — | — | WO | disclosed |
| WO-2005000923-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | SYMYX TECHNOLOGIES, INC. (US) | 2005-01-06 | — | — | WO | disclosed |