SCHEMBL14935740

SCHEMBL14935740

CCCCOC(=O)C(N)CCCCCCCCCCCN

nearest known ligand 0.54

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GNAI3 P08754 1/20 0.54
GNAO1 P09471 1/20 0.54
GNAI1 P63096 1/20 0.54
GSR P00390 1/20 0.48
TLR2 O60603 2/20 0.48
NOD1 Q9Y239 2/20 0.48
DPP8 Q6V1X1 2/20 0.47
DPP9 Q86TI2 2/20 0.47
DPP7 Q9UHL4 2/20 0.47
CPB2 Q96IY4 1/20 0.45
ALDH1A1 P00352 1/20 0.42
RRM1 P23921 1/20 0.41
DPP4 P27487 1/20 0.41
DNM1 Q05193 3/20 0.40
GRIK1 P39086 1/20 0.40
GRIK2 Q13002 1/20 0.40
ATM Q13315 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL722145 1.00 GNAI3 (0.54) GNAI3GNAO1GNAI1GSRTLR2
SCHEMBL721692 1.00 GNAI3 (0.54) GNAI3GNAO1GNAI1GSRTLR2
Hydrochloric Acid SCHEMBL6428766 0.98 GNAI3 (0.53) GNAI3GNAO1GNAI1GSRTLR2
SCHEMBL856465 0.98 GNAI3 (0.51) GNAI3GNAO1GNAI1GSRTLR2
SCHEMBL2494020 0.98 GNAI3 (0.51) GNAI3GNAO1GNAI1GSRTLR2
Hydrochloric Acid SCHEMBL9537364 0.97 GNAI3 (0.50) GNAI3GNAO1GNAI1GSRTLR2
Hydrochloric Acid SCHEMBL10580924 0.97 GNAI3 (0.50) GNAI3GNAO1GNAI1GSRTLR2
SCHEMBL7771135 0.95 GNAI3 (0.56) GNAI3GNAO1GNAI1GSRTLR2
SCHEMBL5267100 0.95 GNAI3 (0.56) GNAI3GNAO1GNAI1GSRTLR2
SCHEMBL10614116 0.95 GNAI3 (0.56) GNAI3GNAO1GNAI1GSRTLR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10248019-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film FUJIFILM CORPORATION (JP) 2019-04-02 US disclosed
EP-1698937-B1 Positive resist composition and pattern-forming method using the same FUJIFILM CORP (JP) 2015-12-23 EP disclosed
US-20130122427-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2013-05-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10248019-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film ACTR3, RXRA, RARA GNAI3 1763/4885GNAO1 2551/4885GNAI1 2435/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.