Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ASAH1 | Q13510 | 5/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.53 |
| ▸ | TSHR | P16473 | 4/20 | 0.53 |
| ▸ | MEN1 | O00255 | 3/20 | 0.53 |
| ▸ | MAPT | P10636 | 2/20 | 0.53 |
| ▸ | POLB | P06746 | 1/20 | 0.53 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.53 |
| ▸ | RAB9A | P51151 | 2/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.49 |
| ▸ | BCHE | P06276 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.47 |
| ▸ | MGAM | O43451 | 1/20 | 0.46 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | SI | P14410 | 1/20 | 0.46 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29145133 | 0.96 | ASAH1 (0.60) | ASAH1KMT2ATSHRMEN1MAPT | |
| SCHEMBL8744445 | 0.95 | ASAH1 (0.62) | ASAH1KMT2ATSHRMEN1MAPT | |
| SCHEMBL29145161 | 0.95 | ASAH1 (0.62) | ASAH1KMT2ATSHRMEN1MAPT | |
| SCHEMBL29145099 | 0.92 | ASAH1 (0.53) | ASAH1KMT2ATSHRMEN1MAPT | |
| SCHEMBL29145104 | 0.87 | ALDH1A1 (0.55) | ASAH1KMT2ATSHRMEN1MAPT | |
| SCHEMBL10504808 | 0.84 | ASAH1 (0.47) | ASAH1KMT2ATSHRMEN1MAPT | |
| SCHEMBL29145145 | 0.82 | SMN1; SMN2 (0.49) | ASAH1KMT2AMEN1MAPTRAB9A | |
| SCHEMBL17165904 | 0.82 | LMNA (0.52) | ASAH1KMT2ATSHRMEN1MAPT | |
| SCHEMBL7351293 | 0.81 | BCHE (0.44) | ASAH1KMT2ATSHRMEN1MAPT | |
| SCHEMBL27844785 | 0.81 | SLC22A12 (0.44) | ASAH1KMT2ATSHRMEN1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117430737-A | Catalyst component for olefin polymerization, catalyst and application thereof | 中国石油化工股份有限公司 | 2024-01-23 | — | — | CN | claimed |
| CN-117384100-A | Carbendazim hapten and artificial antigen as well as preparation methods and application thereof | 河南农业大学 | 2024-01-12 | — | — | CN | claimed |
| WO-2024024801-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-02-01 | — | — | WO | disclosed |
| CN-117430737-A | Catalyst component for olefin polymerization, catalyst and application thereof | 中国石油化工股份有限公司 | 2024-01-23 | — | — | CN | disclosed |
| WO-2023228842-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023228847-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023153294-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| WO-2023095563-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-01 | — | — | WO | disclosed |
| WO-2023095561-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-01 | — | — | WO | disclosed |
| WO-2023276538-A1 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | JSR株式会社 | 2023-01-05 | — | — | WO | disclosed |
| WO-2022209816-A1 | METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2022-10-06 | — | — | WO | disclosed |
| EP-2609468-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM Corporation (JP) | 2013-07-03 | — | — | EP | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| WO-2012026622-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| EP-1641849-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | Symyx Technologies, Inc. (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1641848-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR Corporation (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2005003198-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORPORATION (JP) | 2005-01-13 | — | — | WO | disclosed |
| WO-2005000923-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | SYMYX TECHNOLOGIES, INC. (US) | 2005-01-06 | — | — | WO | disclosed |
| EP-1165514-A1 | 3-(ANILINOMETHYLENE) OXINDOLES AS PROTEIN TYROSINE KINASE AND PROTEIN SERINE/THREONINE KINASE INHIBITORS | GLAXO GROUP LIMITED (GB) | 2002-01-02 | — | — | EP | disclosed |
| WO-2000056710-A1 | 3-(ANILINOMETHYLENE) OXINDOLES AS PROTEIN TYROSINE KINASE AND PROTEIN SERINE/THREONINE KINASE INHIBITORS | GLAXO GROUP LIMITED (GB) | 2000-09-28 | — | — | WO | disclosed |