SCHEMBL722907

SCHEMBL722907

NC(=O)NCOC1CCCC1

nearest known ligand 0.43

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 1/20 0.43
▸ EPHX1 P07099 2/20 0.40
▸ TSHR P16473 2/20 0.39
▸ MEN1 O00255 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.34
▸ NAAA Q02083 3/20 0.34
▸ CYP2C19 P33261 1/20 0.34
▸ HTT P42858 1/20 0.33
▸ CYP19A1 P11511 2/20 0.32
▸ CYP2D6 P10635 1/20 0.32
▸ ALOX5 P09917 1/20 0.31
▸ NPC1 O15118 1/20 0.31
▸ PRSS1 P07477 1/20 0.31
▸ TPSAB1 Q15661 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1644642 0.73 ALDH1A1 (0.42) TDP1EPHX1TSHRKMT2AALDH1A1
SCHEMBL1643500 0.72 EPHX1 (0.42) EPHX1ALDH1A1NAAACYP2C19HTT
SCHEMBL6120762 0.71 HTT (0.40) EPHX1MEN1KMT2ANAAACYP2C19
SCHEMBL25748823 0.70 EPHX1 (0.44) EPHX1ALDH1A1NAAAHTTNPC1
SCHEMBL25748814 0.70 EPHX1 (0.44) EPHX1TSHRMEN1KMT2AALDH1A1
SCHEMBL12599011 0.70 HTT (0.39) EPHX1MEN1KMT2ANAAACYP2C19
SCHEMBL22154807 0.70 HTT (0.39) EPHX1MEN1KMT2ANAAACYP2C19
SCHEMBL237302 0.68 ALOX5 (0.41) EPHX1NAAACYP2C19HTTALOX5
SCHEMBL23465607 0.67 ACACB (0.48) EPHX1
SCHEMBL12599205 0.67 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2609468-A1 METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD FUJIFILM Corporation (JP) 2013-07-03 — — EP disclosed
WO-2013065878-A1 METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD FUJIFILM CORPORATION (JP) 2013-05-10 — — WO disclosed
WO-2012026622-A1 METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2012-03-01 — — WO disclosed
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