Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDE3B | Q13370 | 1/20 | 0.55 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.49 |
| ▸ | NPC1 | O15118 | 6/20 | 0.49 |
| ▸ | RAB9A | P51151 | 6/20 | 0.49 |
| ▸ | HPGD | P15428 | 5/20 | 0.49 |
| ▸ | TP53 | P04637 | 4/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.49 |
| ▸ | TSHR | P16473 | 3/20 | 0.49 |
| ▸ | PKM | P14618 | 3/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | CDK5 | Q00535 | 1/20 | 0.49 |
| ▸ | CDK5R1 | Q15078 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | CASP1 | P29466 | 1/20 | 0.47 |
| ▸ | CASP7 | P55210 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17279787 | 0.90 | PDE3B (0.48) | PDE3BPDE3AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL2834854 | 0.87 | PDE3B (0.49) | PDE3BPDE3AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL6272208 | 0.84 | PDE10A (0.49) | PDE3BPDE3AKDM4EALDH1A1RAB9A | |
| SCHEMBL2843366 | 0.84 | HPGDS (0.54) | PDE3BPDE3ASMN1; SMN2NPC1RAB9A | |
| SCHEMBL1303977 | 0.84 | PTGS2 (0.63) | PDE3BPDE3AKDM4EALDH1A1KMT2A | |
| SCHEMBL8830111 | 0.83 | KDM4E (0.49) | KDM4EALDH1A1SMN1; SMN2NPC1RAB9A | |
| SCHEMBL15305295 | 0.82 | PDE3B (0.48) | PDE3BPDE3AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL10099635 | 0.81 | NR1H3 (0.47) | PDE3BPDE3ASMN1; SMN2NPC1RAB9A | |
| SCHEMBL6468885 | 0.81 | SMN1; SMN2 (0.45) | PDE3BPDE3AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL19529677 | 0.80 | PTGS1 (0.61) | PDE3BPDE3AKDM4EALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | disclosed |
| US-20250068079-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2025-02-27 | — | — | US | disclosed |
| CN-119173819-A | Bio-based solvent for negative imaging | 菲利普·德内·于斯塔德 | 2024-12-20 | — | — | CN | disclosed |
| WO-2024107979-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2024-05-23 | — | — | WO | disclosed |
| EP-2439070-B1 | Infrared-sensitive positive-working image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate | FUJIFILM CORP (JP) | 2019-07-17 | — | — | EP | disclosed |
| EP-2387735-B1 | NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-03-13 | — | — | EP | disclosed |
| US-9040219-B2 | Image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate | FUJIFILM CORPORATION (JP) | 2015-05-26 | — | — | US | disclosed |
| US-9034557-B2 | Chemically amplified positive photoresist composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-05-19 | — | — | US | disclosed |
| US-8535872-B2 | Thermally cured underlayer for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2013-09-17 | — | — | US | disclosed |
| US-20120178871-A1 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | DE BINOD B (US) | 2012-07-12 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-6537718-B2 | Compounds generate an acid upon irradiation with actinic rays | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-25 | — | — | US | disclosed |
| US-20020172886-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2002-11-21 | — | — | US | disclosed |
| US-6376152-B2 | MIXTURE OF A COMPOUND WHICH GENERATES AN ACID UPON RADIATION, RESIN AND NITROGEN-CONTAINING COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-23 | — | — | US | disclosed |
| US-20020028409-A1 | Positive resist laminate | FUJI PHOTO FILM CO., LTD. | 2002-03-07 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20010021479-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-09-13 | — | — | US | disclosed |
| US-20010008739-A1 | Positive photoresist composition for exposure to far ultraviolet ray | FUJIFILM CORPORATION (JP) | 2001-07-19 | — | — | US | disclosed |
| US-6207343-B1 | RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION | FUJI PHOTO FILM CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| EP-0190457-A1 | Derivatives of 3-methyl-imidazo [4,5-c]pyrazole having therapeutic activity and a process for the preparation theref | CAMILLO CORVI S.p.A. (IT) | 1986-08-13 | — | — | EP | disclosed |