SCHEMBL7266017

SCHEMBL7266017

C=C(C(=O)O)C([Si](C)(C)C)[Si](C)(C)C

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 1/20 0.31
GRIK2 Q13002 1/20 0.31
GRM1 Q13255 1/20 0.31
GRM2 Q14416 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4746690 0.76 TDP1 (0.41)
SCHEMBL15939120 0.76 LMNA (0.31)
SCHEMBL28897924 0.70
SCHEMBL5050650 0.69 TP53 (0.39)
SCHEMBL2330448 0.69
SCHEMBL164038 0.69 TP53 (0.40) GRIK1GRIK2GRM1GRM2
SCHEMBL23313 0.67
SCHEMBL2915534 0.67 LMNA (0.46)
SCHEMBL6364020 0.67
SCHEMBL2815802 0.67 TP53 (0.38) GRIK1GRIK2GRM1GRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6653048-B2 Radiation sensitive bilayer resists which are used in manufacture of integrated circuits INTERNATIONAL BUSINESS MACHINES CORP. 2003-11-25 US disclosed
US-20020127490-A1 High silicon content monomers and polymers suitable for 193 nm bilayer resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2002-09-12 US disclosed
US-6444408-B1 High silicon content monomers and polymers suitable for 193 nm bilayer resists INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-03 US disclosed