Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | MAOB | P27338 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | GPR174 | Q9BXC1 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1055253 | 0.99 | KDM4E (0.49) | KDM4EALDH1A1HTTSIGMAR1RAB9A | |
| SCHEMBL10508064 | 0.97 | KDM4E (0.50) | KDM4EALDH1A1HTTSIGMAR1RAB9A | |
| SCHEMBL1056588 | 0.94 | KDM4E (0.55) | KDM4EALDH1A1HTTSIGMAR1RAB9A | |
| SCHEMBL3612069 | 0.88 | KDM4E (0.47) | KDM4EALDH1A1HTTSIGMAR1RAB9A | |
| SCHEMBL14803212 | 0.87 | OPRM1 (0.47) | KDM4EALDH1A1HTTRAB9AMAOB | |
| SCHEMBL31413527 | 0.87 | OPRM1 (0.47) | KDM4EALDH1A1HTTRAB9AMAOB | |
| SCHEMBL18022330 | 0.86 | ACHE (0.60) | KDM4EALDH1A1HTTRAB9AMAOB | |
| SCHEMBL14803207 | 0.85 | SMN1; SMN2 (0.63) | KDM4EALDH1A1HTTSIGMAR1RAB9A | |
| SCHEMBL1507804 | 0.84 | HTT (0.46) | KDM4EALDH1A1HTTRAB9AKMT2A | |
| SCHEMBL18297994 | 0.83 | KMT2A (0.51) | KDM4EALDH1A1RAB9AMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 323 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1249790-C | Ray sensitive compasition for preparing insulation film and display | JSR CORP (JP) | 2006-04-05 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| US-12479960-B2 | Triazine ring-containing polymer and film forming composition containing same | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-12426166-B2 | Method of manufacturing conductive pattern, touch sensor, electromagnetic wave shield, antenna, wiring board, conductive heating element, and structure | FUJIFILM CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| CN-115884875-B | Transfer film, method for producing laminate, method for producing circuit wiring, and method for producing electronic device | 富士胶片株式会社 | 2025-05-30 | — | — | CN | disclosed |
| WO-2025099025-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2025-05-15 | — | — | WO | disclosed |
| CN-115335771-B | Photosensitive transfer material, method for producing resin pattern, and method for producing circuit wiring | 富士胶片株式会社 | 2025-03-25 | — | — | CN | disclosed |
| CN-114599704-B | Triazine ring-containing polymer and film-forming composition containing same | 日产化学株式会社 | 2025-02-14 | — | — | CN | disclosed |
| CN-119422227-A | Protective sheet | 日东电工株式会社 | 2025-02-11 | — | — | CN | disclosed |
| WO-2025013746-A1 | PATTERN-FORMING COMPOSITION | 日産化学株式会社 | 2025-01-16 | — | — | WO | disclosed |
| CN-1445315-A | Ray sensitive compasition for preparing insulation film and display | JSR CORP (JP) | 2003-10-01 | — | — | CN | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1331518-A2 | Radiation sensitive composition for forming an insulating film, insulating film and display device | JSR Corporation (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| EP-0545290-A1 | Aminoalkylpyrrolidinylthiocarbapenem derivatives | BANYU PHARMACEUTICAL CO., LTD. (JP) | 1993-06-09 | — | — | EP | disclosed |
| EP-0544307-A1 | Alkylaminoakylpyrrolidinylthiocarbapenem derivatives | BANYU PHARMACEUTICAL CO., LTD. (JP) | 1993-06-02 | — | — | EP | disclosed |
| EP-0165384-B1 | CARBAPENEM DERIVATIVES, THEIR PREPARATION AND COMPOSITIONS CONTAINING THEM | SANKYO COMPANY LIMITED (JP) | 1989-05-10 | — | — | EP | disclosed |