SCHEMBL730082

SCHEMBL730082

C[Si](OCC(=O)O)(OCC(=O)O)OCC(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.41
CTH P32929 1/20 0.41
CBS P35520 1/20 0.41
THPO P40225 1/20 0.41
THRB P10828 1/20 0.39
FFAR3 O14843 2/20 0.35
PAM P19021 2/20 0.32
EGLN1 Q9GZT9 2/20 0.32
KDM6B O15054 1/20 0.32
KDM5C P41229 1/20 0.32
PHF8 Q9UPP1 1/20 0.32
KDM2A Q9Y2K7 1/20 0.32
ALOX15 P16050 1/20 0.32
NR4A1 P22736 1/20 0.31
APEX1 P27695 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
POLB P06746 1/20 0.31
GLA P06280 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
HDAC3 O15379 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4275231 0.87 TSHR (0.36) TSHRCTHCBSTHPOTHRB
SCHEMBL2675755 0.85
SCHEMBL17237464 0.82 TSHR (0.41) TSHRCTHCBSTHPOTHRB
SCHEMBL8999694 0.77 ALDH1A1 (0.35)
SCHEMBL2163046 0.74 TSHR (0.40) TSHRCTHCBSTHPOTHRB
SCHEMBL8950684 0.73
SCHEMBL28549728 0.72 TSHR (0.33) TSHRCTHCBSTHPOTHRB
SCHEMBL17460318 0.72 FFAR3 (0.38) TSHRCTHCBSTHPOTHRB
SCHEMBL646068 0.70 TSHR (0.36) TSHRCTHCBSTHPOTHRB
SCHEMBL18100552 0.70 FFAR3 (0.36) TSHRCTHCBSTHPOTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3663301-B1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-08-30 EP claimed
US-10985013-B2 Method and precursors for manufacturing 3D devices VERSUM MATERIALS US, LLC (US) 2021-04-20 US claimed
US-20190304775-A1 Method and Precursors for Manufacturing 3D Devices VERSUM MATERIALS US, LLC (US) 2019-10-03 US claimed
US-10354860-B2 Method and precursors for manufacturing 3D devices VERSUM MATERIALS US, LLC (US) 2019-07-16 US claimed
US-20180047898-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY AIR PRODUCTS AND CHEMICALS, INC. 2018-02-15 US claimed
EP-3268997-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY Versum Materials US, LLC (US) 2018-01-17 EP claimed
WO-2016144960-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-09-15 WO claimed
US-20160225616-A1 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-08-04 US claimed
EP-3051001-A2 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-08-03 EP claimed
EP-1482070-B1 MECHANICAL ENHANCER ADDITIVES FOR LOW DIELECTRIC FILMS AIR PROD & CHEM (US) 2015-11-11 EP claimed
US-8137764-B2 organosilicate film formed by plasma-enhanced chemical vapor deposition from a first silicon-containing precursor that comprises from 3 to 4 Si O bonds per Si atom, from 0 to 1 of Si H, Si Br, and Si Cl bonds per Si atom and a second silicon-containing precursor comprises at least one Si C bond per Si AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-03-20 US claimed
US-20040241463-A1 Mechanical enhancer additives for low dielectric films VERSUM MATERIALS US, LLC 2004-12-02 US claimed
EP-1482070-A1 Mechanical enhancer additives for low dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-12-01 EP claimed
EP-3663301-B1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-08-30 EP disclosed
US-11605535-B2 Boron-containing compounds, compositions, and methods for the deposition of a boron containing films VERSUM MATERIALS US, LLC (US) 2023-03-14 US disclosed
US-11164739-B2 Use of silicon structure former with organic substituted hardening additive compounds for dense OSG films VERSUM MATERIALS US, LLC (US) 2021-11-02 US disclosed
EP-2199428-A2 Method for removal of carbon from an organosilicate material Air Products and Chemicals, Inc. (US) 2010-06-23 EP disclosed
US-20100151206-A1 Method for Removal of Carbon From An Organosilicate Material AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-06-17 US disclosed
US-20040241463-A1 Mechanical enhancer additives for low dielectric films VERSUM MATERIALS US, LLC 2004-12-02 US disclosed
EP-1482070-A1 Mechanical enhancer additives for low dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-12-01 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11605535-B2 Boron-containing compounds, compositions, and methods for the deposition of a boron containing films CD79B, BCL6B, BCL6 TSHR 4628/4885CTH 3268/4885CBS 1443/4885
US-10354860-B2 Method and precursors for manufacturing 3D devices MEF2D, HTR3D, NSD3 TSHR 3442/4885CTH 4702/4885CBS 4724/4885
US-20190304775-A1 Method and Precursors for Manufacturing 3D Devices MEF2D, HTR3D, NSD3 TSHR 3442/4885CTH 4702/4885CBS 4724/4885
US-10985013-B2 Method and precursors for manufacturing 3D devices MEF2D, HTR3D, NSD3 TSHR 3442/4885CTH 4702/4885CBS 4724/4885
US-20160225616-A1 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES MEF2D, HTR3D, NSD3 TSHR 3442/4885CTH 4702/4885CBS 4724/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.