SCHEMBL730323

SCHEMBL730323

c1cc(COCC2CO2)cc(COCC2CO2)c1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.52
ALDH1A1 P00352 3/20 0.52
SMN1; SMN2 Q16637 2/20 0.52
TP53 P04637 1/20 0.52
CYP3A4 P08684 1/20 0.52
HIF1A Q16665 1/20 0.52
TDP1 Q9NUW8 1/20 0.44
LMNA P02545 1/20 0.44
GLA P06280 1/20 0.41
TAAR1 Q96RJ0 1/20 0.41
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
MGLL Q99685 2/20 0.40
MAPK1 P28482 1/20 0.38
DRD1 P21728 1/20 0.38
PRMT5 O14744 1/20 0.37
WDR77 Q9BQA1 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14397248 1.00 TSHR (0.52) TSHRALDH1A1SMN1; SMN2TP53CYP3A4
SCHEMBL10362663 0.92 TSHR (0.45) TSHRALDH1A1SMN1; SMN2TP53CYP3A4
SCHEMBL21755727 0.92 MGLL (0.48) TSHRALDH1A1SMN1; SMN2TP53CYP3A4
SCHEMBL27818132 0.92 ALDH1A1 (0.45) TSHRALDH1A1SMN1; SMN2TP53CYP3A4
SCHEMBL18740732 0.92 MGLL (0.48) TSHRALDH1A1SMN1; SMN2TP53CYP3A4
SCHEMBL18430305 0.90 MGLL (0.47) TSHRALDH1A1SMN1; SMN2TP53CYP3A4
SCHEMBL21164067 0.90 CYP3A4 (0.46) TSHRALDH1A1SMN1; SMN2TP53CYP3A4
SCHEMBL8857144 0.88 CYP3A4 (0.50) TSHRALDH1A1SMN1; SMN2TP53CYP3A4
SCHEMBL28185451 0.88 TSHR (0.48) TSHRALDH1A1SMN1; SMN2TP53CYP3A4
SCHEMBL24172680 0.87 ALDH1A1 (0.45) TSHRALDH1A1SMN1; SMN2TP53CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114525072-A Polyethers containing cyclic groups other than bisphenols 宣伟投资管理有限公司 2022-05-24 CN claimed
EP-2788398-B1 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATINGS APPLICATIONS THEREOF SUN CHEMICAL CORP (US) 2018-07-25 EP claimed
US-9624380-B2 Sulfide extended epoxy resins and barrier coating applications thereof SUN CHEMICAL CORPORATION (US) 2017-04-18 US claimed
US-20170051177-A1 POLYETHERS CONTAINING NON-BISPHENOLIC CYCLIC GROUPS SWIMC LLC 2017-02-23 US claimed
US-20140370220-A1 OVERPRINT VARNISHES WITH NON-AQUOUS DISPERSIONS SUN CHEMICAL CORPORATION (US) 2014-12-18 US claimed
US-20140342091-A1 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATING APPLICATIONS THEREOF SUN CHEMICAL CORPORATION (US) 2014-11-20 US claimed
EP-2788398-A2 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATINGS APPLICATIONS THEREOF Sun Chemical Corporation (US) 2014-10-15 EP claimed
WO-2013090702-A2 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATINGS APPLICATIONS THEREOF SUN CHEMICAL CORPORATION (US) 2013-06-20 WO claimed
US-20240239954-A1 POLYESTER COPOLYMER AND COATING COMPOSITIONS THEREFROM HAVING IMPROVED CORROSION RESISTANCE SWIMC LLC (US) 2024-07-18 US disclosed
EP-4347733-A1 POLYESTER COPOLYMER AND COATING COMPOSITIONS THEREFROM HAVING IMPROVED CORROSION RESISTANCE Swimc LLC (US) 2024-04-10 EP disclosed
CN-114907291-B Modified reactive diluent and preparation method thereof, and epoxy resin for carbon fiber and preparation method thereof 厦门市宜帆达新材料有限公司 2024-01-12 CN disclosed
WO-2022251858-A1 POLYESTER COPOLYMER AND COATING COMPOSITIONS THEREFROM HAVING IMPROVED CORROSION RESISTANCE SWIMC LLC (US) 2022-12-01 WO disclosed
CN-114907291-A Modified reactive diluent and preparation method thereof, and epoxy resin for carbon fibers and preparation method thereof 厦门市宜帆达新材料有限公司 2022-08-16 CN disclosed
CN-114525072-A Polyethers containing cyclic groups other than bisphenols 宣伟投资管理有限公司 2022-05-24 CN disclosed
US-7235593-B2 Mixing in the absence of actinic radiation a triarylsulfonium, diaryliodonium, dialkylphenacylsulfonium or hydroxyphenyldialkylsulfonium photoinitiator with an oxetane or oxirane monomer/oligomer component and pre-irradiating to activate while controlling temperature to prevent spontaneous polymerization RENSSELAER POLYTECHNIC INSTITUTE (US) 2007-06-26 US disclosed
US-20070112100-A1 MERCAPTAN-HARDENED EPOXY POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL COMPANY, LP 2007-05-17 US disclosed
WO-2007022217-A1 MERCAPTAN-HARDENED EPOXY POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2007-02-22 WO disclosed
US-7132501-B2 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2006-11-07 US disclosed
US-20050215757-A1 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2005-09-29 US disclosed
EP-1482002-A1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS, INC. (JP) 2004-12-01 EP disclosed