⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8049997 | 0.75 | — | — | |
| SCHEMBL8049996 | 0.75 | — | — | |
| SCHEMBL6537201 | 0.69 | — | — | |
| SCHEMBL10116483 | 0.65 | — | — | |
| SCHEMBL23717566 | 0.65 | — | — | |
| SCHEMBL12149824 | 0.62 | — | — | |
| SCHEMBL11479438 | 0.62 | ALDH1A1 (0.35) | — | |
| SCHEMBL22360557 | 0.62 | — | — | |
| SCHEMBL26235161 | 0.62 | — | — | |
| SCHEMBL4365772 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8137892-B2 | Photobase generator and photocurable resin composition | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2012-03-20 | — | — | US | disclosed |
| US-20100151386-A1 | PHOTOBASE GENERATOR AND PHOTOCURABLE RESIN COMPOSITION | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |