Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NQO2 | P16083 | 1/20 | 0.54 |
| ▸ | IDO1 | P14902 | 2/20 | 0.50 |
| ▸ | CDK2 | P24941 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.48 |
| ▸ | HPGD | P15428 | 3/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.48 |
| ▸ | RECQL | P46063 | 2/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | APP | P05067 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | CASP1 | P29466 | 1/20 | 0.48 |
| ▸ | SNCA | P37840 | 1/20 | 0.48 |
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 4/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31037127 | 1.00 | NQO2 (0.54) | NQO2IDO1CDK2HSD17B10HPGD | |
| SCHEMBL9241923 | 0.82 | NQO2 (0.83) | NQO2IDO1HPGDCYP1A2MAPT | |
| SCHEMBL1314866 | 0.82 | IDO1 (0.60) | NQO2IDO1CDK2HSD17B10HPGD | |
| SCHEMBL4869305 | 0.81 | IDO1 (0.73) | IDO1CDK2HSD17B10HPGDCYP1A2 | |
| SCHEMBL29351230 | 0.81 | IDO1 (0.73) | IDO1CDK2HSD17B10HPGDCYP1A2 | |
| SCHEMBL20356057 | 0.81 | BACE1 (0.50) | NQO2HPGDTDP1SNCAALDH1A1 | |
| SCHEMBL28327 | 0.81 | IDO1 (0.73) | IDO1CDK2HSD17B10HPGDCYP1A2 | |
| SCHEMBL25672705 | 0.79 | LMNA (0.52) | NQO2IDO1HSD17B10HPGDCYP1A2 | |
| SCHEMBL27053816 | 0.79 | NQO2 (0.48) | NQO2IDO1CDK2HSD17B10MAPT | |
| SCHEMBL10551961 | 0.79 | ALDH1A1 (0.50) | NQO2IDO1CDK2HSD17B10HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230194990-A1 | PHOTORESIST UNDERLAYER COMPOSITION | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-06-22 | — | — | US | disclosed |
| US-20230194990-A1 | PHOTORESIST UNDERLAYER COMPOSITION | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-06-22 | — | — | US | disclosed |
| US-10676837-B2 | High edge cathodic epoxy electrocoat composition | SWIMC LLC (US) | 2020-06-09 | — | — | US | disclosed |
| WO-2018123207-A1 | NAPHTHOBISCHALCOGENADIAZOLE DERIVATIVE AND PRODUCTION METHOD THEREFOR | 国立大学法人大阪大学 | 2018-07-05 | — | — | WO | disclosed |
| EP-3212720-A1 | HIGH EDGE CATHODIC EPOXY ELECTROCOAT COMPOSITION | Valspar Sourcing, Inc. (US) | 2017-09-06 | — | — | EP | disclosed |
| US-20170226653-A1 | High Edge Cathodic Epoxy Electrocoat Composition | VALSPAR SOURCING, INC. (US) | 2017-08-10 | — | — | US | disclosed |
| CN-106922151-A | High rim negative electrode epoxy electrodeposition coating composition | 威士伯采购公司 | 2017-07-04 | — | — | CN | disclosed |
| WO-2016069545-A1 | HIGH EDGE CATHODIC EPOXY ELECTROCOAT COMPOSITION | VALSPAR SOURCING, INC. (US) | 2016-05-06 | — | — | WO | disclosed |
| EP-1454919-B2 | SCALE DEPOSIT INHIBITOR, PROCESS FOR ITS PRODUCTION, POLYMERIZER WHOSE INSIDE WALL IS COVERED WITH THE INHIBITOR, AND PROCESS FOR PRODUCTION OF VINYLIC POLYMERS BY THE USE OF THE POLYMERIZER | TOKUYAMA CORP (JP) | 2012-10-31 | — | — | EP | disclosed |
| EP-2479203-A1 | AROMATIC POLYESTER | Muroran Institute of Technology (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-6894125-B2 | Scale deposit inhibitor, process for its production, polymerizer whose inside wall is covered with the inhibitor, and process for production of vinylic polymers by the use of the polymerizer | TOKUYAMA CORPORATION (JP) | 2005-05-17 | — | — | US | disclosed |
| EP-1454919-A1 | SCALE DEPOSIT INHIBITOR, PROCESS FOR ITS PRODUCTION, POLYMERIZER WHOSE INSIDE WALL IS COVERED WITH THE INHIBITOR, AND PROCESS FOR PRODUCTION OF VINYLIC POLYMERS BY THE USE OF THE POLYMERIZER | Tokuyama Corporation (JP) | 2004-09-08 | — | — | EP | disclosed |
| US-20040077804-A1 | Scale deposit inhibitor, process for its production, polymerizer whose inside wall is covered with the inhibitor, and process for production of vinylic polymers by the use of the polymerizer | TOKUYAMA CORPORATION (JP) | 2004-04-22 | — | — | US | disclosed |
| CN-1489599-A | Scale deposit inhibitor, process for its production, polymerizer whose wall in corered with inhibitor, and process for production of vinylic polymers by polymerizer | ��ʽ�����ɽ | 2004-04-14 | — | — | CN | disclosed |
| EP-0810249-B1 | Thermosetting resin composition, electrically insulated coil, electric rotating machine and method for producing same | HITACHI LTD (JP) | 2001-11-07 | — | — | EP | disclosed |
| US-5982056-A | STATOR OF ROTATING MACHINE | HITACHI, LTD. (JP) | 1999-11-09 | — | — | US | disclosed |
| EP-0810249-A2 | Thermosetting resin composition, electrically insulated coil, electric rotating machine and method for producing same | HITACHI, LTD. (JP) | 1997-12-03 | — | — | EP | disclosed |
| EP-0644232-B1 | Free radical cured rubber | GOODYEAR TIRE & RUBBER (US) | 1997-03-05 | — | — | EP | disclosed |
| EP-0644232-A1 | Free radical cured rubber | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1995-03-22 | — | — | EP | disclosed |
| US-5310811-A | Abrasion resistance | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1994-05-10 | — | — | US | disclosed |