Aziridine

Aziridine

SCHEMBL736208

C1CN1.CO[SiH](OC)OC

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 1/20 0.36
MAPT P10636 1/20 0.36
PDE4A P27815 1/20 0.36
KDR P35968 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclopropane SCHEMBL734540 0.93 ALDH1A1 (0.41) HIF1AMAPTPDE4AKDR
Azetidine SCHEMBL554375 0.89 CXCR4 (0.35)
Azepane SCHEMBL554686 0.87 ALDH1A1 (0.53)
Piperidine SCHEMBL28503554 0.85 ALDH1A1 (0.50)
Methylpiperazine SCHEMBL556633 0.81 PHGDH (0.33)
Morpholine SCHEMBL9139154 0.79 MEN1 (0.50)
Azetidine SCHEMBL28957083 0.78
SCHEMBL37612 0.78
SCHEMBL9788071 0.78
Cyclopropane SCHEMBL613518 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114787951-A Tantalum capacitor with enhanced stability 京瓷AVX元器件公司 2022-07-22 CN claimed
CN-114787952-A Solid electrolytic capacitor comprising a precoat and an intrinsically conductive polymer 京瓷AVX元器件公司 2022-07-22 CN claimed
US-20070148588-A1 METHODS OF RELEASING PHOTORESIST FILM FROM SUBSTRATE AND BONDING PHOTORESIST FILM WITH SECOND SUBSTRATE SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-06-28 US claimed
EP-1801652-A2 Methods of releasing photoresist film from substrate and bonding photoresist film with second substrate Samsung Electronics Co., Ltd. (KR) 2007-06-27 EP claimed
CN-118159351-A Composite filtration membranes providing increased flow 佛兰芒技术研究所有限公司 2024-06-07 CN disclosed
CN-115066475-A Addition curable silicone adhesive composition 迈图高新材料公司 2022-09-16 CN disclosed
CN-110545997-B Substrate laminate and method for manufacturing substrate laminate 三井化学株式会社 2022-05-24 CN disclosed
CN-109071762-B Polyisocyanurate plastic containing siloxane group and method for producing same 科思创德国股份有限公司 2022-03-11 CN disclosed
CN-114086170-A Pretreating agent and chemical conversion treating agent 日本帕卡濑精株式会社 2022-02-25 CN disclosed
CN-114026184-A Resistant 2K-PUR coatings 科思创知识产权两合公司 2022-02-08 CN disclosed
CN-108884245-B Polyimide film and method for producing same 柯尼卡美能达株式会社 2021-10-29 CN disclosed
CN-113475169-A Low loss dielectric composite comprising hydrophobized fused silica 罗杰斯公司 2021-10-01 CN disclosed
US-20120107823-A1 MICRO-DEVICE AND METHODS FOR DISRUPTING CELLS SAMSUNG ELECTRONICS CO., LTD. (JP) 2012-05-03 US disclosed
EP-2447352-A1 Micro-device and methods for disrupting cells Samsung Electronics Co., Ltd. (KR) 2012-05-02 EP disclosed
US-8137523-B2 Apparatus for and method of separating polarizable analyte using dielectrophoresis SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-03-20 US disclosed
US-20070284254-A1 APPARATUS FOR AND METHOD OF SEPARATING POLARIZABLE ANALYTE USING DIELECTROPHORESIS SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-12-13 US disclosed
US-20070148588-A1 METHODS OF RELEASING PHOTORESIST FILM FROM SUBSTRATE AND BONDING PHOTORESIST FILM WITH SECOND SUBSTRATE SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-06-28 US disclosed
EP-1801652-A2 Methods of releasing photoresist film from substrate and bonding photoresist film with second substrate Samsung Electronics Co., Ltd. (KR) 2007-06-27 EP disclosed
EP-0895530-B1 BINDER AND ITS USE IN RADIATION-CURABLE COATING AGENTS BASF COATINGS AG (DE) 2003-11-12 EP disclosed
US-6177144-B1 Binder and its use in radiation-curable coating agents BASF COATINGS AG (DE) 2001-01-23 US disclosed