SCHEMBL74718

SCHEMBL74718

C=C(C)C(=O)OC12CC3CC(O)(CC(O)(C3)C1)C2

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.32
DPP4 P27487 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13383478 1.00 ALDH1A1 (0.32) ALDH1A1DPP4
SCHEMBL31661874 1.00 ALDH1A1 (0.32) ALDH1A1DPP4
SCHEMBL22266852 1.00 ALDH1A1 (0.32) ALDH1A1DPP4
SCHEMBL15281489 1.00 ALDH1A1 (0.32) ALDH1A1DPP4
SCHEMBL6559178 0.97 ALDH1A1 (0.32) ALDH1A1
SCHEMBL677948 0.91 ALDH1A1 (0.32) ALDH1A1
SCHEMBL677952 0.90 MEN1 (0.31)
SCHEMBL13300081 0.90
SCHEMBL22176770 0.88
SCHEMBL1483990 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1886 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121559814-B Ultraviolet curing nano-imprint photoresist with semi-interpenetrating network structure and preparation method thereof 中国科学技术大学 2026-05-12 CN claimed
CN-119708332-A Polymer for ArF photoresist, preparation method of polymer and photoresist composition 中节能万润股份有限公司 2025-03-28 CN claimed
CN-115542665-B Positive chemical amplification type photoresist and application method thereof 徐州博康信息化学品有限公司 2025-03-07 CN claimed
CN-119119348-A Methacrylate-styrene copolymer and preparation method and application thereof 拓烯科技(衢州)有限公司 2024-12-13 CN claimed
CN-117466733-A Synthesis method of acid-catalyzed naphthene methacrylate 成都东凯芯半导体材料有限公司 2024-01-30 CN claimed
CN-115542665-A Positive chemical amplification type photoresist and using method thereof 徐州博康信息化学品有限公司 2022-12-30 CN claimed
US-8916330-B2 Chemically amplified photoresist composition and method for forming resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-12-23 US claimed
US-8883394-B2 2014-11-11 US claimed
CN-1550894-B Chemical amplification photo etching glue composition SUMITOMO CHEMICAL CO., LTD. (JP) 2011-11-30 CN claimed
US-20100330497-A1 CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-12-30 US claimed
EP-1766474-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2007-03-28 EP claimed
WO-2005121894-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONICS MATERIALS USA CORP. (DE) 2005-12-22 WO claimed
US-20050271974-A1 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. 2005-12-08 US claimed
CN-1630551-A Process for producing film forming resins for photoresist compositions CLARIANT FINANCE BVI LTD (VG) 2005-06-22 CN claimed
CN-1550894-A Chemical amplification photo etching glue composition 住友化学工业株式会社 2004-12-01 CN claimed
EP-1443363-A2 Compounds for photoresist and resin composition for photoresist Daicel Chemical Industries, Ltd. (JP) 2004-08-04 EP claimed
EP-1379331-A2 PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS CLARIANT INTERNATIONAL LTD. (CH) 2004-01-14 EP claimed
US-6610465-B2 One filter sheet of a self-supported fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin; other filter sheet of a self supporting matrix of fibers, such as cellulose fibers CLARIANT FINANCE (BVI) LIMITED (VG) 2003-08-26 US claimed
US-20020197555-A1 Process for producing film forming resins for photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2002-12-26 US claimed
WO-2002084402-A2 PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS CLARIANT INTERNATIONAL LTD (CH) 2002-10-24 WO claimed