⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7618854 | 1.00 | — | — | |
| SCHEMBL18655709 | 1.00 | — | — | |
| SCHEMBL7006466 | 0.85 | — | — | |
| SCHEMBL14345886 | 0.85 | — | — | |
| SCHEMBL10783575 | 0.85 | — | — | |
| SCHEMBL11653074 | 0.83 | ADORA2A (0.41) | — | |
| SCHEMBL7009020 | 0.83 | ADORA2A (0.45) | — | |
| SCHEMBL2132134 | 0.83 | — | — | |
| SCHEMBL2132138 | 0.83 | — | — | |
| SCHEMBL5555667 | 0.83 | ADORA2A (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4011351-A | HIGH ENERGY RADIATION, PHOTORESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1977-03-08 | — | — | US | claimed |
| CN-119890439-A | Battery cell | 庄信万丰股份有限公司 | 2025-04-25 | — | — | CN | disclosed |
| CN-117820215-A | Method for producing 2-chloronicotinic acid | 荣峰投资控股有限公司 | 2024-04-05 | — | — | CN | disclosed |
| CN-111393361-A | Safe and environment-friendly 2-chloronicotinic acid synthesis method | 浙江日出药业有限公司 | 2020-07-10 | — | — | CN | disclosed |
| CN-107835826-A | The not dirty polymer of self-cradling type, its composition and relevant monomer | 华盛顿大学 | 2018-03-23 | — | — | CN | disclosed |
| US-20170121292-A1 | HIV REPLICATION INHIBITING PYRIMIDINES | JANSSEN PHARMACEUTICA NV (BE) | 2017-05-04 | — | — | US | disclosed |
| US-9580392-B2 | HIV replication inhibiting pyrimidines | JANSSEN PHARMACEUTICA NV (BE) | 2017-02-28 | — | — | US | disclosed |
| US-9192577-B2 | Pharmaceutical compositions comprising a basic drug compound, a surfactant, and a physiologically tolerable water soluble acid | JANSSEN PHARMACEUTICA NV (BE) | 2015-11-24 | — | — | US | disclosed |
| CN-102449466-B | Device for detecting object to be detected | SENOVA SYSTEMS INC | 2015-05-06 | — | — | CN | disclosed |
| US-20140343006-A1 | HIV Replication Inhibiting Pyrimidines | JANSSEN PHARMACEUTICA NV (NL) | 2014-11-20 | — | — | US | disclosed |
| US-4314933-A | 2,2,6,6-TETRAALKYLPIPERIDINE COMPOUNDS | CIBA-GEIGY CORPORATION (US) | 1982-02-09 | — | — | US | disclosed |
| EP-0006564-B1 | 2-(3.5-DISUBSTITUTED-2-HYDROXYPHENYL)-2H-BENZOTRIAZOLES AND STABILIZED COMPOSITIONS CONTAINING THEM | CIBA-GEIGY AG (CH) | 1981-12-30 | — | — | EP | disclosed |
| US-4278589-A | 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole and stabilized compositions | CIBA-GEIGY CORPORATION (US) | 1981-07-14 | — | — | US | disclosed |
| US-4278590-A | AUTOMOBILE FINISHES | CIBA-GEIGY CORPORATION (US) | 1981-07-14 | — | — | US | disclosed |
| EP-0016723-A1 | Light stabilisation of two-layer composite lacquers | CIBA-GEIGY AG (CH) | 1980-10-01 | — | — | EP | disclosed |
| EP-0015230-A1 | Stabilized organic Polymer comprising 2-(2-hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole as a light-stabilizer | CIBA-GEIGY AG (CH) | 1980-09-03 | — | — | EP | disclosed |
| EP-0006213-A1 | Light stabilization of acid catalysed stoving enamels | CIBA-GEIGY AG (CH) | 1980-01-09 | — | — | EP | disclosed |
| EP-0006564-A2 | 2-(3.5-disubstituted-2-hydroxyphenyl)-2H-benzotriazoles and stabilized compositions containing them | CIBA-GEIGY AG (CH) | 1980-01-09 | — | — | EP | disclosed |
| EP-0002753-A2 | Stabilisation of heat-curable metallic enamel paints against the action of light, humidity and oxygen by the addition of polyalkylpiperidine derivatives | CIBA-GEIGY AG (CH) | 1979-07-11 | — | — | EP | disclosed |
| US-4011351-A | HIGH ENERGY RADIATION, PHOTORESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1977-03-08 | — | — | US | disclosed |