SCHEMBL7475145

SCHEMBL7475145

Cc1cc(C(F)C(F)(F)C(F)(F)F)ccc1OS(=O)(=O)c1ccccc1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.41
ESR1 P03372 2/20 0.41
KMT2A Q03164 2/20 0.41
ESR2 Q92731 2/20 0.41
GAA P10253 2/20 0.41
CYP1A2 P05177 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
ATM Q13315 1/20 0.38
HTR6 P50406 1/20 0.37
POLB P06746 2/20 0.36
ALDH1A1 P00352 3/20 0.35
LMNA P02545 3/20 0.35
HSD11B1 P28845 2/20 0.34
MCL1 Q07820 1/20 0.34
PARP1 P09874 1/20 0.31
PARP2 Q9UGN5 1/20 0.31
ABCC9 O60706 1/20 0.31
ABCC8 Q09428 1/20 0.31
KCNJ11 Q14654 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7454336 0.86 MAPT (0.42) MEN1KMT2AGAAHTR6ALDH1A1
SCHEMBL8501653 0.86 MEN1 (0.37) MEN1ESR1KMT2AESR2GAA
SCHEMBL8501139 0.85 MEN1 (0.39) MEN1ESR1KMT2AESR2GAA
SCHEMBL3844089 0.78 MEN1 (0.46) MEN1ESR1KMT2AESR2GAA
SCHEMBL3839448 0.74 ESR1 (0.50) MEN1ESR1KMT2AESR2GAA
SCHEMBL8502928 0.74 KMT2A (0.52) MEN1ESR1KMT2AESR2GAA
SCHEMBL29150913 0.72 KMT2A (0.64) MEN1ESR1KMT2AESR2GAA
SCHEMBL3845371 0.71 CYP1A2 (0.47) MEN1ESR1KMT2AESR2GAA
SCHEMBL7521769 0.71 ALPL (0.39) KMT2AGAAALDH1A1LMNAHSD11B1
SCHEMBL3842873 0.71 ESR2 (0.49) MEN1ESR1KMT2AESR2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1245638-A1 Composition for insulating film formation JSR Corporation (JP) 2002-10-02 EP disclosed
EP-0956312-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR Corporation (JP) 1999-11-17 EP disclosed
WO-1998033836-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR CORPORATION (JP) 1998-08-06 WO disclosed