Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL5366895 | 0.95 | — | — | |
| SCHEMBL2741138 | 0.94 | — | — | |
| SCHEMBL26043219 | 0.93 | — | — | |
| SCHEMBL775869 | 0.93 | — | — | |
| SCHEMBL179826 | 0.87 | — | — | |
| SCHEMBL19771561 | 0.86 | — | — | |
| SCHEMBL19261616 | 0.86 | — | — | |
| SCHEMBL10087715 | 0.86 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL24008859 | 0.85 | — | — | |
| SCHEMBL15183384 | 0.85 | GPR35 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 705 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8632948-B2 | Positive-working photoimageable bottom antireflective coating | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-01-21 | — | — | US | claimed |
| US-12372867-B2 | Photoresists comprising multiple acid generator compounds | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) | 2025-07-29 | — | — | US | disclosed |
| US-12038689-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240134276-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, FLUORINE-CONTAINING RESIN CURED FILM, AND DISPLAY | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-25 | — | — | US | disclosed |
| US-20240134278-A1 | SURFACE MODIFIER, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND DISPLAY | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-25 | — | — | US | disclosed |
| EP-4317197-A1 | METHOD FOR PRODUCING POLYMER BY REVERSIBLE ADDITION-FRAGMENTATION CHAIN TRANSFER POLYMERIZATION | FUJIFILM Corporation (JP) | 2024-02-07 | — | — | EP | disclosed |
| EP-4317204-A1 | MANUFACTURING METHOD FOR POLYMER HAVING THIOCARBONYLTHIO GROUP REMOVED | FUJIFILM Corporation (JP) | 2024-02-07 | — | — | EP | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20070105044-A1 | Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-05-10 | — | — | US | disclosed |
| US-20070105044-A1 | Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-05-10 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| EP-1754999-A2 | Positive resist composition and method of pattern formation with the same | Fuji Photo Film Co., Ltd. (JP) | 2007-02-21 | — | — | EP | disclosed |
| US-20070026341-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20070003867-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| US-20070003867-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| US-20050227173-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-10-13 | — | — | US | disclosed |
| US-20050227174-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-10-13 | — | — | US | disclosed |