⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17611074 | 0.86 | — | — | |
| SCHEMBL17611180 | 0.84 | MAOA (0.35) | — | |
| SCHEMBL3973741 | 0.79 | — | — | |
| SCHEMBL3227379 | 0.78 | — | — | |
| SCHEMBL371505 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL11691339 | 0.77 | — | — | |
| SCHEMBL11507436 | 0.73 | TAAR1 (0.34) | — | |
| SCHEMBL371463 | 0.73 | — | — | |
| SCHEMBL379162 | 0.73 | — | — | |
| SCHEMBL1898403 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12421178-B2 | Non-cryogenic, ammonia-free reduction of aryl compounds | University of Pittsburgh—of the Commonwealth System of Higher Education (US) | 2025-09-23 | — | — | US | disclosed |
| WO-2024210060-A1 | REDUCTION METHOD | 国立大学法人北海道大学 | 2024-10-10 | — | — | WO | disclosed |
| US-20240092708-A1 | Non-Cryogenic, Ammonia-Free Reduction of Aryl Compounds | UNIVERSITY OF PITTSBURGH - OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION | 2024-03-21 | — | — | US | disclosed |
| US-11866386-B2 | Non-cryogenic, ammonia-free reduction of aryl compounds | University of Pittsburgh—of the Commonwealth System of Higher Education (US) | 2024-01-09 | — | — | US | disclosed |
| US-20220089508-A1 | Non-Cryogenic, Ammonia-Free Reduction of Aryl Compounds | UNIVERSITY OF PITTSBURGH - OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION | 2022-03-24 | — | — | US | disclosed |
| EP-1718629-B1 | Benzopyran compounds useful for the treatment of arrhytmia | NISSAN CHEMICAL IND LTD (JP) | 2012-12-26 | — | — | EP | disclosed |
| US-7964623-B2 | Tricyclic benzopyrane compound | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2011-06-21 | — | — | US | disclosed |
| US-7964623-B2 | Tricyclic benzopyrane compound | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2011-06-21 | — | — | US | disclosed |
| EP-1732929-B1 | TRICYCLIC BENZOPYRAN COMPOUND AS ANTI-ARRHYTHMIC AGENTS | NISSAN CHEMICAL IND LTD (JP) | 2010-10-20 | — | — | EP | disclosed |
| US-7781483-B2 | Benzopyran compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20100069374-A1 | Tricyclic benzopyrane compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-03-18 | — | — | US | disclosed |
| WO-2010018867-A1 | DI-SUBSTITUTED BENZOPYRANE COMPOUND | 日産化学工業株式会社 (JP) | 2010-02-18 | — | — | WO | disclosed |
| US-7652008-B2 | 2,2,7,9-tetramethyl-4-[(2-phenylethyl)amino]-3,4-dihydro-2H-pyrano[2,3-g]quinolin-3-ol; 3-hydroxy-2,2,9-trimethyl-4-[(2-phenylethyl)amino]-3,4-dihydro-2H-pyrano[2,3-g]quinolin-7-carbonitrile; have the prolongation effect on refractory period | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-26 | — | — | US | disclosed |
| US-7652008-B2 | 2,2,7,9-tetramethyl-4-[(2-phenylethyl)amino]-3,4-dihydro-2H-pyrano[2,3-g]quinolin-3-ol; 3-hydroxy-2,2,9-trimethyl-4-[(2-phenylethyl)amino]-3,4-dihydro-2H-pyrano[2,3-g]quinolin-7-carbonitrile; have the prolongation effect on refractory period | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-26 | — | — | US | disclosed |
| US-20080004262-A1 | Tricyclic Benzopyrane Compound as Anti-Arrhythmic Agents | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20080004262-A1 | Tricyclic Benzopyrane Compound as Anti-Arrhythmic Agents | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20070299130-A1 | Benzopyran Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| EP-0760362-B1 | DIAMINOMETHYLIDENE DERIVATIVE | NISSHIN SEIFUN GROUP INC (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-4613596-A | ANTAGONISTS FOR HISTAMINE H2 RECEPTORS, ANTIULCER, SKIN DISORDERS | MAGIS FARMACEUTRICI S.R.L. (IT) | 1986-09-23 | — | — | US | disclosed |
| EP-0092647-A1 | New active compounds in the treatment of ulcers and skin allergy symptoms | MAGIS FARMACEUTICI S.p.A. (IT) | 1983-11-02 | — | — | EP | disclosed |