SCHEMBL75111

SCHEMBL75111

CC(C)(C)CC(C)(C)OO

nearest known ligand 0.41

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.41
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tert-Butyl Hydroperoxide SCHEMBL7633137 0.94 ALDH1A1 (0.53) ALDH1A1TSHR
Bicarbonate SCHEMBL28613286 0.89 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL8983691 0.86 ALDH1A1 (0.47) ALDH1A1TSHR
Pivalate SCHEMBL29039967 0.83 TSHR (0.32) ALDH1A1TSHR
SCHEMBL2952150 0.75 TSHR (0.32) ALDH1A1TSHR
SCHEMBL7598260 0.73 ALDH1A1 (0.41) ALDH1A1TSHR
SCHEMBL43019 0.72 ALDH1A1 (0.53) ALDH1A1TSHR
SCHEMBL11214348 0.72 TSHR (0.31) ALDH1A1TSHR
SCHEMBL679132 0.72 TSHR (0.31) ALDH1A1TSHR
SCHEMBL70932 0.72 ALDH1A1 (0.47) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 7097 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12568848-B2 Film, laminate, semiconductor wafer with film layer, substrate for mounting a semiconductor with film layer, and semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-03-03 US claimed
US-12534559-B2 Resin composition, resin sheet, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer, and semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-01-27 US claimed
EP-3256094-B1 DENTAL COMPOSITIONS AND METHODS OF USE ZEST IP HOLDINGS LLC (US) 2026-01-07 EP claimed
EP-3807229-B1 PROCESS FOR THE PRODUCTION OF COMPOSITE ARTICLES NOURYON CHEMICALS INT BV (NL) 2025-10-22 EP claimed
EP-4634154-A1 PROCESS FOR PREPARING A TERTIARY ALKYL ORGANIC PEROXIDE Nouryon Chemicals International B.V. (NL) 2025-10-22 EP claimed
US-12410125-B2 Method for purifying alkyl hydroperoxide by extraction with water and separation of the aqueous phase ARKEMA FRANCE (FR) 2025-09-09 US claimed
EP-4591847-A1 2-COMPONENT DENTAL MATERIALS BASED ON CROSSLINKED POLYMERIC PARTICLES BEARING ACYLTHIOUREA GROUPS Ivoclar Vivadent AG (LI) 2025-07-30 EP claimed
US-12331164-B2 Curable siloxane resin composition KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2025-06-17 US claimed
EP-4471010-B1 PROCESS FOR PREPARING A PEROXYESTER OR PEROXYCARBONATE NOURYON CHEMICALS INT BV (NL) 2025-06-04 EP claimed
WO-2025107284-A1 (METH) ACRYLATE-BASED ADHESIVE COMPOSITION FOR TWO-STEP ADHESIVE SYSTEMS HENKEL AG & CO. KGAA (DE) 2025-05-30 WO claimed
US-4401500-A SILICONE RUBBERS, ALKOXYSILANE, HYDROPEROXIDE DOW CORNING CORPORATION (US) 1983-08-30 US claimed
US-4396737-A PEROXY COMPOUNDS, PHOTOCHROMIC AGENTS PPG INDUSTRIES, INC. (US) 1983-08-02 US claimed
EP-0080338-A2 Polymerization of polyol (allyl carbonate) using polymerization initiators of short and long half lives PPG INDUSTRIES, INC. (US) 1983-06-01 EP claimed
US-4370467-A CYANATE, PEROXIDE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1983-01-25 US claimed
US-4322320-A Process for formulating silicone rubber products GENERAL ELECTRIC COMPANY (US) 1982-03-30 US claimed
US-4241222-A CROSSLINKING AGENTS PENNWALT CORPORATION (US) 1980-12-23 US claimed
US-4161556-A Protective coating for glass substrate OWENS-ILLINOIS, INC. (US) 1979-07-17 US claimed
US-4065589-A Polymeric coating for protection of glass substrate OWENS-ILLINOIS, INC. (US) 1977-12-27 US claimed
US-4061609-A POLYSILOXANE GENERAL ELECTRIC COMPANY (US) 1977-12-06 US claimed
US-3944511-A Chemically modified polymers OWENS-ILLINOIS, INC. (US) 1976-03-16 US claimed