SCHEMBL7515025

SCHEMBL7515025

CC(N)(N)Oc1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA4 P22748 1/20 0.43
LTA4H P09960 2/20 0.41
TSHR P16473 1/20 0.41
TAAR1 Q96RJ0 3/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
CA9 Q16790 2/20 0.41
SLC6A2 P23975 1/20 0.41
MAPK1 P28482 1/20 0.39
KCNN4 O15554 1/20 0.38
MAOA P21397 1/20 0.37
RIPK1 Q13546 1/20 0.36
ALDH1A1 P00352 2/20 0.36
MMP1 P03956 1/20 0.36
MMP2 P08253 1/20 0.36
MMP13 P45452 1/20 0.36
ALOX15 P16050 1/20 0.36
SOS1 Q07889 1/20 0.35
PPARG P37231 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL29119752 0.89 ALDH1A1 (0.41) CA1CA2CA9ALDH1A1MMP1
SCHEMBL11713703 0.84 CA4 (0.43) CA4LTA4HTSHRTAAR1CA1
SCHEMBL10760660 0.84 CA4 (0.43) CA4LTA4HTSHRTAAR1CA1
Bromide SCHEMBL11719044 0.82 CA4 (0.42) CA4LTA4HTSHRTAAR1CA1
SCHEMBL1369857 0.80 SLC6A2 (0.43) CA4LTA4HTSHRTAAR1SLC6A2
SCHEMBL5675865 0.78 TAAR1 (0.46) CA4LTA4HTSHRTAAR1SLC6A2
SCHEMBL3034923 0.78 MAPK1 (0.44) CA4LTA4HTSHRTAAR1SLC6A2
SCHEMBL93074 0.78 CA4 (0.48) CA4LTA4HTSHRSLC6A2MAPK1
SCHEMBL4224012 0.78 CA4 (0.48) CA4LTA4HTSHRMAPK1MAOA
SCHEMBL1660600 0.78 CA4 (0.48) CA4LTA4HTSHRMAPK1RIPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119731282-A Chemical mechanical polishing composition for metal alloy and polishing method thereof 昂士特科技(深圳)有限公司 2025-03-28 CN disclosed
CN-119301207-A Chemical mechanical polishing composition and method for silicon-based materials 昂士特科技(深圳)有限公司 2025-01-10 CN disclosed
CN-117778115-A In-situ cleaning composition and in-situ cleaning method for silicon-containing substrate 昂士特科技(深圳)有限公司 2024-03-29 CN disclosed
CN-117511413-A Chemical mechanical polishing composition for metal alloy and polishing method thereof 昂士特科技(深圳)有限公司 2024-02-06 CN disclosed
CN-115926629-B Chemical mechanical polishing composition with improved recycling properties 昂士特科技(深圳)有限公司 2023-12-05 CN disclosed
CN-116814168-A Chemical mechanical polishing composition and method for silicon-based materials 昂士特科技(深圳)有限公司 2023-09-29 CN disclosed
CN-116254059-A Chemical mechanical polishing composition for edge polishing 昂士特科技(深圳)有限公司 2023-06-13 CN disclosed
EP-1227785-A2 PROCESS FOR PRODUCING A HAIRDYE COMPOSITION Lion Corporation (JP) 2002-08-07 EP disclosed
EP-1189576-A2 HAIR COMPOSITION COMPRISING AN OXIDASE AND CYCLODEXTRIN Lion Corporation (JP) 2002-03-27 EP disclosed
EP-1187596-A2 HAIRDYE COMPOSITION COMPRISING INDOLINE AND/OR AN INDOLINE COMPOUND AND LACCASE Lion Corporation (JP) 2002-03-20 EP disclosed
EP-1165027-A1 HAIRDYE COMPOSITION OF SINGLE PREPARATION TYPE CONTAINING AN OXIDASE Lion Corporation (JP) 2002-01-02 EP disclosed
WO-2001068042-A1 METHOD FOR DYEING DRY HAIR NOVOZYMES A/S (DK) 2001-09-20 WO disclosed
WO-2001000144-A2 HAIR COMPOSITION COMPRISING AN OXIDASE AND CYCLODEXTRIN LION CORPORATION (JP) 2001-01-04 WO disclosed
WO-2000078274-A2 HAIRDYE COMPOSITION COMPRISING INDOLINE AND/OR AN INDOLINE COMPOUND AND LACCASE LION CORPORATION (JP) 2000-12-28 WO disclosed
WO-2000078273-A2 PROCESS FOR PRODUCING A HAIRDYE COMPOSITION LION CORPORATION (JP) 2000-12-28 WO disclosed
WO-2000059459-A1 HAIRDYE COMPOSITION OF SINGLE PREPARATION TYPE CONTAINING AN OXIDASE LION CORPORATION (JP) 2000-10-12 WO disclosed