⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7521664 | 1.00 | — | — | |
| SCHEMBL17017282 | 0.81 | — | — | |
| SCHEMBL31679616 | 0.81 | — | — | |
| SCHEMBL4484821 | 0.78 | — | — | |
| SCHEMBL4484818 | 0.78 | — | — | |
| SCHEMBL15290275 | 0.76 | — | — | |
| SCHEMBL7416284 | 0.76 | — | — | |
| SCHEMBL8008972 | 0.75 | — | — | |
| SCHEMBL17017289 | 0.75 | FAAH (0.39) | — | |
| SCHEMBL18092328 | 0.75 | FAAH (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6479219-B2 | POSITIVE WORKING PHOTORESISTS, IN PARTICULAR AS THE TOP IMAGING LAYER IN A BILAYER RESIST SCHEME FOR USE IN THE MANUFACTURE OF INTEGRATED CIRCUITS; OXIDATION RESISTANCE WHEN ETCHING | 3M INNOVATIVE PROPERTIES COMPANY | 2002-11-12 | — | — | US | disclosed |
| US-20020055065-A1 | Polymers having silicon-containing acetal or ketal functional groups | 3M INNOVATIVE PROPERTIES COMPANY | 2002-05-09 | — | — | US | disclosed |
| US-6359078-B1 | RESIST MATERIALS FOR USE IN LITHOGRAPHY, FOR EXAMPLE, IN THE PRODUCTION OF INTEGRATED CIRCUITS | 3M INNOVATIVE PROPERTIES COMPANY | 2002-03-19 | — | — | US | disclosed |
| EP-1108237-A1 | POLYMERS HAVING SILICON-CONTAINING ACETAL OR KETAL FUNCTIONAL GROUPS | 3M Innovative Properties Company (US) | 2001-06-20 | — | — | EP | disclosed |
| WO-2000011520-A1 | POLYMERS HAVING SILICON-CONTAINING ACETAL OR KETAL FUNCTIONAL GROUPS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2000-03-02 | — | — | WO | disclosed |