Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14527514 | 1.00 | CYP19A1 (0.36) | CYP19A1MEN1POLBGAAKMT2A | |
| SCHEMBL12332849 | 0.90 | CYP19A1 (0.34) | CYP19A1 | |
| SCHEMBL6853761 | 0.82 | CYP19A1 (0.31) | CYP19A1 | |
| SCHEMBL18560088 | 0.79 | CYP19A1 (0.35) | CYP19A1 | |
| SCHEMBL438933 | 0.79 | CYP19A1 (0.35) | CYP19A1 | |
| SCHEMBL28204575 | 0.77 | CYP19A1 (0.40) | CYP19A1MEN1POLBGAAKMT2A | |
| SCHEMBL4741902 | 0.77 | CYP19A1 (0.33) | CYP19A1MEN1POLBGAAKMT2A | |
| SCHEMBL3978903 | 0.74 | CYP19A1 (0.33) | CYP19A1MEN1POLBGAAKMT2A | |
| SCHEMBL9908352 | 0.74 | CYP19A1 (0.30) | CYP19A1 | |
| SCHEMBL17070182 | 0.74 | CYP19A1 (0.30) | CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 410 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12038691-B2 | Method for producing substrate with patterned film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| EP-4306558-A1 | BIOELECTRODE, PRODUCTION METHOD FOR BIOELECTRODE, AND MEASUREMENT METHOD FOR BIOSIGNALS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-17 | — | — | EP | disclosed |
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230324798-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-12 | — | — | US | disclosed |
| US-20230305393-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230288800-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-14 | — | — | US | disclosed |
| US-20230259027-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-17 | — | — | US | disclosed |
| US-11709426-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20070099113-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099113-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| EP-1780199-A1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-20070009832-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-11 | — | — | US | disclosed |
| EP-1741705-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-01-10 | — | — | EP | disclosed |
| CN-1527808-A | Process for production of fluorine-containing norbornene derivatives | ͬ�Ϳ�ҵ��ʽ���� | 2004-09-08 | — | — | CN | disclosed |