Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | APEX1 | P27695 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL75150 | 0.89 | TSHR (0.51) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL13486939 | 0.88 | TSHR (0.54) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL24600152 | 0.85 | — | — | |
| SCHEMBL9610668 | 0.84 | THRB (0.46) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL28255783 | 0.83 | THRB (0.48) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL4318664 | 0.83 | THRB (0.48) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL1415468 | 0.83 | THRB (0.48) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL615661 | 0.82 | THRB (0.52) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL15432454 | 0.81 | THRB (0.50) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL75528 | 0.81 | TSHR (0.44) | THRBTSHRALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 307 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240427248-A1 | RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2024-12-26 | — | — | US | disclosed |
| CN-116970119-A | Fluorine-containing resin for immersion photoresist and preparation method and application thereof | 宁波南大光电材料有限公司 | 2023-10-31 | — | — | CN | disclosed |
| US-11786160-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| WO-2023195255-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2023-10-12 | — | — | WO | disclosed |
| WO-2023189502-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTODEGRADABLE BASE | JSR株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023153296-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| WO-2023153294-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| WO-2023153295-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| US-20230251575-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-08-10 | — | — | US | disclosed |
| US-20230244143-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | JSR CORPORATION (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090087786-A1 | PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090087786-A1 | PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090081595-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090081595-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090053651-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-20090053651-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-20080199806-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-08-21 | — | — | US | disclosed |
| US-20080199806-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-08-21 | — | — | US | disclosed |