Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.51 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | APEX1 | P27695 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13486939 | 0.95 | TSHR (0.54) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL75247 | 0.89 | THRB (0.47) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL13240555 | 0.86 | TSHR (0.51) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL15801130 | 0.86 | TSHR (0.55) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL12416078 | 0.85 | TSHR (0.50) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL28255973 | 0.84 | TSHR (0.53) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL6849323 | 0.84 | TSHR (0.56) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL13265878 | 0.83 | TSHR (0.33) | TSHR | |
| SCHEMBL28254642 | 0.82 | TSHR (0.55) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL26287228 | 0.82 | ALDH1A1 (0.48) | TSHRHTTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 311 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7135595-B2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-11-14 | — | — | US | claimed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | claimed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | claimed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | claimed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | claimed |
| WO-2024127808-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-11786160-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11656548-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-05-23 | — | — | US | disclosed |
| US-11357970-B2 | Biomedical electrode composition, biomedical electrode and method for manufacturing the biomedical electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-14 | — | — | US | disclosed |
| US-11208509-B2 | Polymer compound for conductive polymer and method for producing same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-28 | — | — | US | disclosed |
| US-10851188-B2 | Polymer compound for conductive polymer and method for producing same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-12-01 | — | — | US | disclosed |
| US-7135595-B2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-11-14 | — | — | US | disclosed |
| US-20060128914-A1 | photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-15 | — | — | US | disclosed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | disclosed |
| US-20050124827-A1 | Precursors to fluoroalkanol-containing olefin monomers and associated methods of synthesis and use | GLOBALFOUNDRIES U.S. INC. | 2005-06-09 | — | — | US | disclosed |
| US-20050124828-A1 | Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use | GLOBALFOUNDRIES U.S. INC. | 2005-06-09 | — | — | US | disclosed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | disclosed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | disclosed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050124827-A1 | Precursors to fluoroalkanol-containing olefin monomers and associated methods of synthesis and use | FASN, ELOVL1, PFAS | TSHR 4455/4885THRB 2951/4885POLB 641/4885 |
| US-20050124828-A1 | Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use | PFAS, FASN, ELOVL1 | TSHR 4200/4885THRB 2803/4885POLB 717/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.