SCHEMBL7528889

SCHEMBL7528889

CC(C)c1cc(O)c(C(C)C)c(O)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.56
GABRB2 P47870 2/20 0.56
TRPA1 O75762 2/20 0.50
PTGS1 P23219 1/20 0.50
CACNA1C Q13936 1/20 0.50
AHR P35869 1/20 0.47
TYR P14679 3/20 0.43
ALDH1A1 P00352 2/20 0.43
ALOX12 P18054 2/20 0.43
HTT P42858 2/20 0.43
HIF1A Q16665 2/20 0.43
GAA P10253 1/20 0.43
TDP1 Q9NUW8 5/20 0.40
KDM4E B2RXH2 5/20 0.40
MAPT P10636 4/20 0.40
ALOX15 P16050 2/20 0.40
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
RNASEH1 O60930 1/20 0.40
MDM4 O15151 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16527692 0.87 GABRA1 (0.50) GABRA1GABRB2TRPA1PTGS1CACNA1C
SCHEMBL27930401 0.86 AHR (0.45) GABRA1GABRB2TRPA1PTGS1CACNA1C
SCHEMBL24838149 0.85 GABRA1 (0.48) GABRA1GABRB2TRPA1PTGS1CACNA1C
SCHEMBL1487378 0.85 PTGS1 (0.54) GABRA1GABRB2TRPA1PTGS1CACNA1C
SCHEMBL27439431 0.85 GABRA1 (0.65) GABRA1GABRB2TRPA1PTGS1CACNA1C
SCHEMBL31545189 0.80 GABRA1 (0.44) GABRA1GABRB2TRPA1PTGS1CACNA1C
SCHEMBL9744348 0.80 AHR (0.48) GABRA1GABRB2TRPA1PTGS1CACNA1C
SCHEMBL6346880 0.80 GABRA1 (0.73) GABRA1GABRB2TRPA1PTGS1CACNA1C
SCHEMBL1494320 0.78 TRPA1 (0.56) GABRA1GABRB2TRPA1PTGS1CACNA1C
SCHEMBL1494319 0.78 SELL (0.52) GABRA1GABRB2TRPA1PTGS1CACNA1C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1938251-A Process for the monoalkylation of dihydroxy aromatic compounds GEN ELECTRIC (US) 2007-03-28 CN claimed
US-20230173078-A1 SMARCA DEGRADERS AND USES THEREOF KYMERA THERAPEUTICS, INC. 2023-06-08 US disclosed
US-20230173078-A1 SMARCA DEGRADERS AND USES THEREOF KYMERA THERAPEUTICS, INC. 2023-06-08 US disclosed
CN-1157355-C Novel ester compound and themrosetting resin composition using the same ס�ѻ�ѧ��ҵ��ʽ���� 2004-07-14 CN disclosed
CN-1155655-C Arylester compound and its prep, epoxy resin composition using the compound and copper-coated laminated ס�ѻ�ѧ��ҵ��ʽ���� 2004-06-30 CN disclosed
US-6469109-B2 COPPER CLAD LAMINATES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-10-22 US disclosed
EP-0699670-B1 Aryl ester compound, its production process, epoxy resin composition using said compound, and copper-clad laminate using the epoxy resin composition SUMITOMO CHEMICAL CO (JP) 2002-03-06 EP disclosed
US-20020010288-A1 Copper clad laminates UEDA YOUICHI (JP) 2002-01-24 US disclosed
US-6270899-B1 AS CURING AGENT FOR EPOXY RESIN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-07 US disclosed
CN-1284521-A Aromatic ester compound and its prep., expoxy resin composition using the same and coper-coated laminate SUMITOMO CHEMICAL CO (JP) 2001-02-21 CN disclosed
EP-0811619-B1 Novel ester compound and thermosetting resin composition using the same SUMITOMO CHEMICAL CO (JP) 2000-09-27 EP disclosed
US-5916683-A Copper-clad laminate with prepreg of epoxy resin and aryl ester SUMITOMO CHEMICAL COMPANY, LTD. (JP) 1999-06-29 US disclosed
US-5726257-A Esterified resorcinol-carbonyl compound condensates and epoxy resins therewith SUMITOMO CHEMICAL COMPANY, LTD. (JP) 1998-03-10 US disclosed
CN-1170710-A Novel ester compound and themrosetting resin composition using the same SUMITOMO CHEMICAL CO (JP) 1998-01-21 CN disclosed
EP-0811619-A1 Novel ester compound and thermosetting resin composition using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1997-12-10 EP disclosed
CN-1125218-A Novel aryl ester compound, process for producing the same, epoxy resin composition using the same, and copper-clad laminate using the same SUMITOMO CHEMICAL CO (JP) 1996-06-26 CN disclosed
EP-0699670-A2 Aryl ester compound, its production process, epoxy resin composition using said compound, and copper-clad laminate using the epoxy resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1996-03-06 EP disclosed
US-5087548-A POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., INC. (JP) 1992-02-11 US disclosed
EP-0227487-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-07-01 EP disclosed
US-4129413-A Oxidation hair dyes based upon tetraaminopyrimidine developers and mono- and dialkyl -m- dihydroxy benzene couplers HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) 1978-12-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230173078-A1 SMARCA DEGRADERS AND USES THEREOF SMARCA1, SMARCA2, SMARCC2 GABRA1 3632/4885GABRB2 4184/4885TRPA1 4796/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.