Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.50 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.50 |
| ▸ | HCAR2 | Q8TDS4 | 5/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.41 |
| ▸ | RECQL | P46063 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | GABRP | O00591 | 2/20 | 0.33 |
| ▸ | GABRD | O14764 | 2/20 | 0.33 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.33 |
| ▸ | GABRB1 | P18505 | 2/20 | 0.33 |
| ▸ | GABRG2 | P18507 | 2/20 | 0.33 |
| ▸ | GABRB3 | P28472 | 2/20 | 0.33 |
| ▸ | GABRA5 | P31644 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7535770 | 1.00 | TSHR (0.50) | TSHRTP53EGLN1EGLN3HCAR2 | |
| SCHEMBL6136073 | 1.00 | TSHR (0.50) | TSHRTP53EGLN1EGLN3HCAR2 | |
| SCHEMBL11777328 | 1.00 | TSHR (0.50) | TSHRTP53EGLN1EGLN3HCAR2 | |
| SCHEMBL11305485 | 1.00 | TSHR (0.50) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Fumaric Acid SCHEMBL6697956 | 0.85 | TSHR (0.60) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Maleic Acid SCHEMBL6697953 | 0.85 | TSHR (0.60) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Maleic Acid SCHEMBL11123967 | 0.85 | TSHR (0.60) | TSHRTP53EGLN1EGLN3HCAR2 | |
| Fumaric Acid SCHEMBL29778246 | 0.85 | TSHR (0.60) | TSHRTP53EGLN1EGLN3HCAR2 | |
| SCHEMBL5077222 | 0.78 | FFAR3 (0.32) | FFAR3LCKFYN | |
| SCHEMBL34467186 | 0.77 | TSHR (0.56) | TSHRTP53EGLN1EGLN3HCAR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4101326-A | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters | EASTMAN KODAK COMPANY (US) | 1978-07-18 | — | — | US | claimed |
| EP-0849636-B1 | Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element | KODAK POLYCHROME GRAPHICS CO (US) | 2002-04-10 | — | — | EP | disclosed |
| US-6270945-B1 | BLEND OF PHOTOPOLYMERIZABLE POLYMER AND DYE | KODAK POLYCHROME GRAPHICS, LLC | 2001-08-07 | — | — | US | disclosed |
| US-5962189-A | Photosensitive composition containing photosensitive polyamide and thiazoline photoinitiator and negative working photosensitive element | KODAK POLYCHROME GRAPHICS LLC (US) | 1999-10-05 | — | — | US | disclosed |
| US-5925498-A | Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates | KODAK POLYCHROME GRAPHICS LLC (US) | 1999-07-20 | — | — | US | disclosed |
| US-5879858-A | COMPOSITION COMPRISING RESIN CONTAINING UNSATURATED PHOTOCROSSLINKABLE GROUPS, PHOTOPOLYMERIZABLE MONOMER, PHOTOCROSSLINKABLE POLYESTER RESIN, PHOTOINITIATOR | KODAK POLYCHROME GRAPHICS, LLC (US) | 1999-03-09 | — | — | US | disclosed |
| US-5821032-A | A PHOTOCURABLE FORMULATION CONTAINS ETHYLENICALLY UNSATURATED PHOTOCROSSLINKABLE GROUPS, AN ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE MONOMER, A CROSSLINKABLE POLYESTER, CROSSLINKABLE STYRENE-MALEIC ANHYDRIDE AND PHOTOINITIATOR | KODAK POLYCHROME GRAPHICS, LLC (US) | 1998-10-13 | — | — | US | disclosed |
| EP-0849636-A1 | Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element | EASTMAN KODAK COMPANY (US) | 1998-06-24 | — | — | EP | disclosed |
| EP-0576622-B1 | LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK CO (US) | 1997-11-05 | — | — | EP | disclosed |
| EP-0472228-B1 | Radiation-sensitive composition containing a vinyl pyrrolidone polymer and use thereof in lithographic printing plates | EASTMAN KODAK CO (US) | 1997-09-10 | — | — | EP | disclosed |
| US-4640886-A | ANODIZED, SILICATED ALUMINUM SUPPORT, RADIATION SENSITIVE POLYESTER, BENZOIC ACID LAYERS TO IMPROVE INCUBATION STABILITY | EASTMAN KODAK COMPANY (US) | 1987-02-03 | — | — | US | disclosed |
| EP-0055897-B1 | PROCESS FOR CAPTURE AND STORAGE OF LIGHT ENERGY BY ENDOERGIC ISOMERIZATIONS | THE STANDARD OIL COMPANY (US) | 1986-11-26 | — | — | EP | disclosed |
| EP-0199467-A1 | Polyesters comprising recurring photoconductive and photocrosslinkable units and elements thereof | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1986-10-29 | — | — | EP | disclosed |
| US-4609606-A | LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY (US) | 1986-09-02 | — | — | US | disclosed |
| EP-0070898-B1 | IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1985-10-16 | — | — | EP | disclosed |
| EP-0123493-A1 | Photochemical conversion and storage of light energy by photoisomerization of compounds such as norbornadiene and its derivatives | THE STANDARD OIL COMPANY (US) | 1984-10-31 | — | — | EP | disclosed |
| US-4419437-A | SULFONIMIDE-CONTAINING AROMATIC DICARBOXYLIC ACID | EASTMAN KODAK COMPANY (US) | 1983-12-06 | — | — | US | disclosed |
| US-4394858-A | PHOTOCATALYSTS COMPRISING METAL CARBONYL COMPOUNDS | STANDARD OIL COMPANY (US) | 1983-07-26 | — | — | US | disclosed |
| EP-0055897-A2 | Process for capture and storage of light energy by endoergic isomerizations | THE STANDARD OIL COMPANY (US) | 1982-07-14 | — | — | EP | disclosed |
| US-4101326-A | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters | EASTMAN KODAK COMPANY (US) | 1978-07-18 | — | — | US | disclosed |